Abstract: An enhanced spatial light modulator (ESLM) array, a microelectronics patterning system and a projection display system using such an ESLM for heat-minimization and resolution enhancement during imaging, and the method for fabricating such an ESLM array. The ESLM array includes, in each individual pixel element, a small pixel mirror (reflective region) and a much larger pixel surround. Each pixel surround includes diffraction-grating regions and resolution-enhancement regions. During imaging, a selected pixel mirror reflects a selected-pixel beamlet into the capture angle of a projection lens, while the diffraction grating of the pixel surround redirects heat-producing unused radiation away from the projection lens. The resolution-enhancement regions of selected pixels provide phase shifts that increase effective modulation-transfer function in imaging. All of the non-selected pixel surrounds redirect all radiation energy away from the projection lens.

Abstract: This invention discloses a high-precision alignment system for aligning a mask with a wafer in a high-resolution microlithography system. This alignment system has a high-sensitivity mask-wafer displacement detection system characterized by an optical heterodyne technique that uses two laser frequencies to generate by diffraction and interference a displacement signal at a different frequency, and has a high-precision mask-wafer positioning system that uses a laser modulation spectroscopic technique characterized by controlling the cavity spacing of a highly stable optical resonator with a modulated frequency-stabilized laser, making it possible to align a wafer pattern with a mask pattern with a precision on the order of a few nanometers.

Abstract: Variable display presentation of carpet samples with variable juxtaposition is accomplished by a presentation display storage system which is economical, light in weight, easily assembled without tools, easily movable and subject to easy rearrangement of the samples. The system is made up of a wheeled starbase which supports a vertical spindle upon which presentation platforms are mounted. A slide-and-spin-resistant support slider is positioned at a baseline position axially on the spindle. A bottom presentation platform, made up of a relatively fragile lightweight presentation platform shelf and a hold-down slider, cantilever the presentation platform by compressing the shelf between itself and the support slider. The top surface of the hold-down slider forms a support surface for the presentation platform shelf of the overlying presentation platform, in sequence.

Abstract: This scan and repeat lithography system has high resolution capability, large effective image field size, and high substrate exposure speed, and comprises: (a) a substrate stage capable of scanning a substrate in one dimension and, when not scanning in said dimension, capable of moving laterally in a direction perpendicular to the scan direction so as to position the substrate for another scan; the substrate stage exposing the full substrate by breaking up the substrate area into parallel strips, and exposing each of the strips by scanning the length of the strip across a fixed illumination region; (b) a mask stage capable of scanning in the same direction as, and synchronized with, the substrate stage, at a speed faster than the substrate stage scanning speed by a certain ratio M; (c) an illumination subsystem having an effective source plane in the shape of a polygon, and capable of uniformly illuminating a polygon-shaped region on the mask; (d) a projection subsystem having an object-to-image reduction rat

Abstract: An excimer laser source system that produce radiation characterized by a wavelength with a high degree of stability and by a narrow spectral bandwidth is described. Such an excimer laser system is suitable as a source in high-resolution high-throughput lithography. Key features of the disclosed system are: frequency-locking of the excimer laser center wavelength to the cavity spacing of a highly stable external Fabry-Perot or other resonator; stabilization of the external resonator by referencing its cavity spacing to a frequency-locked reference laser; stabilization of the reference laser by locking its frequency to a fundamental atomic or molecular transistion; and provision of an intra-cavity or other Fabry-Perot resonator in the excimer laser optical cavity to both narrow the spectral bandwidth of the laser and to select its center wavelength.