Abstract: In an apparatus for initial ion cleaning, vapor metal deposition and protective coating of objects by vacuum deposition, an improved high voltage high current feedthru fitting with improved anti-fouling arc-resistant characteristics. The apparatus includes a vacuum chamber for receiving the objects which are held on a movable rack or support. A metal such as aluminum is vaporized centrally in the chamber in a well known fashion after the chamber has been substantially evacuated of air molecules for uniform vapor deposition of the metal atop exposed surfaces of the objects. The improved feedthru fitting is connected through a wall of an elongated housing which is connected over an elongated opening formed through a chamber side wall. An elongated conductive preferably aluminum rod is disposed within the housing along the opening into the chamber interior generally coextensive with two apertured delivery tubes or members positioned within the housing.