Abstract: A wafer level burn-in method for static-random access memory. The SRAM memory has a plurality of word lines and a plurality of bit lines. The SRAM memory also has pull up circuits and equalizer circuits connected to various bit lines. All the word lines are switched on for testing any leakage in the gate dielectric layer. A high potential is applied to a bit line of every bit line pairs and a low potential is applied to the other bit line of the bit line pairs. The pull-up circuits and the equalizer circuits are shut down. The current at a steady state is used to judge the normality of an SRAM chip.

Abstract: A device structure and a method of fabricating an electrostatic discharge (ESD) protection circuit on a semiconductor device. A substrate is provided. A layer of silicon oxide is formed on the substrate. A photoresist mask is formed on the layer of silicon oxide. A species of n-type ions is implanted into the surface to form source/drain regions in the ESD protection area. After removing the photoresist, a metal layer is blanket deposited over the surface. A thermal process is performed to form salicide layers on the source/drain regions. A patterned photoresist is respectively formed to cover a portion of the salicide layer. An etching process is performed to strip away the exposed portion of the salicide layer.

Abstract: A method of conducting a laser repair operation. A silicon wafer has a plurality of chips thereon. Each chips has a plurality of bonding pads, a plurality of testing pads, a plurality of fuses and a passivation layer for protecting the chips. The passivation layer exposes the bonding pads and the testing pads. A bump-forming process is conducted to form a bottom metallic layer and a bump sequentially over each bonding pad. Only a bottom metallic layer is formed over each testing pad. The bumps are formed, for example, by electroplating or printing. Testing is carried out by probing various bottom metallic layers above the testing pads. Finally, a laser repair is conducted.

Abstract: A vibration isolation spring mount is disclosed. A compression coil spring is inserted between an inner sleeve and an outer sleeve and a pair of pads are disposed on the inner sleeve and the outer sleeve. Outwardly extending blades disposed on the open end of the inner sleeve are inserted into the spaces defined by inwardly extending teeth disposed on the open end of the outer sleeve, then the blades are rotated relative to the teeth until the teeth and the blades impingingly engage due to the compressed compression coil spring biasing the teeth against the blades.

Abstract: A silicon-on-insulator low-voltage-triggered silicon controlled rectifier device structure that is built upon a substrate and an insulation layer. The insulation layer has a plurality of isolation structures thereon to define a device region. A first-type well and a second-type well are formed over the insulation layer. The first-type and second-type wells are connected. A first gate and a second gate are formed over the first-type well and the second-type well, respectively. The first-type well further includes a first second-type doped region and a first first-type doped region formed between the first second-type doped region and the isolation structure adjacent to the first second-type doped region. The first second-type doped region and the first first-type doped region together form a cathode of the SOI-SCR device. A second first-type doped region is formed within the first-type well between the first second-type doped region and the first gate structure adjacent to the first second-type doped region.

Abstract: A structure of an ESD protection circuit device located under a pad, protecting an internal circuit and a method of manufacturing the same are disclosed. The ESD protection circuit device having a pad window, located under a pad, includes a semiconductor substrate having a P-well and an N-well. The P-well and the N-well have an interface. A predetermined area, pad window is selected in the substrate. A first STI structure, a second STI structure and a third STI structure are formed in the substrate within the pad window. N-type doped regions are formed P-well and in the N-well. First p-type doped regions are formed in the P-well and in the N-well and second p-type doped regions are formed in the P-well and in the N-well. A first zener diode is formed in the N-well and a second zener diode is formed in the P-well.

Abstract: A method is provided for cleaning a dual damascene structure. A first metal layer, a cap layer, and a dielectric layer are formed on a substrate in sequence. Then a dual damascene opening is formed in the dielectric layer and the cap layer exposing the first metal layer. Next, a post-etching cleaning step is carried out to clean the dual damascene opening using a fluorine-based solvent. Then, an argon gas plasma is sputtered to clean the dual damascene opening before a second metal layer fills in the dual damascene opening.

Abstract: A heat dissipation apparatus, suitable for use to direct the heat generated from an electric appliance that has a circuit board, on which several electronic devices (heat sources) are formed. The heat dissipation apparatus has a main heat sink and several connecting heat sinks. The main heat sink is mounted on each electronic device, while the connecting heat sinks are disposed between the electronic devices and the main heat sink, allowing the heat generated from each electronic device to be conducted to the main heat sink. The heat dissipation apparatus is assembled in various kinds of electric appliances such as power supply or other electric products.

Abstract: A bonding pad structure. The bonding pad structure includes independently built current conduction structure and mechanical support structure between a bonding pad layer and a substrate. The current conduction structure is constructed using a plurality of serially connected conductive metallic layers each at a different height between the bonding pad layer and the substrate. The conductive metallic layers connect with each other via a plurality of plugs. At least one of the conductive metallic layers connects electrically with a portion of the device in the substrate by a signal conduction line. The mechanical support structure is constructed using a plurality of serially connected supportive metallic layers each at a different height between the bonding pad layer and the substrate. The supportive metallic layers connect with each other via a plurality of plugs.

Abstract: A transformer with an associated heat-dissipating plastic element is provided. The transformer includes a hollow main body, a core, a coil and a heat-dissipating plastic element. The core is installed inside the hollow main body while the coil wraps around the core. The heat-dissipating plastic element is also installed inside the hollow main body. The heat-dissipating plastic element encloses the core and the coil. Alternatively, the heat-dissipating plastic element encloses the hollow main body, the core and the coil so that heat generated by the coil may be directly conducted away to the exterior through the heat-dissipating plastic element.

Abstract: A method for manufacturing low cost electroluminescent (EL) illuminated membrane switches is disclosed. The method includes the first step of die cutting, embossing or chemically etching the metal foil surface of a metal foil bonded, light transmitting flexible electrical insulation to simultaneously form one or more front capacitive electrodes, membrane switch contacts and electrical shunt, electrical distribution means and electrical terminations that together comprise a flexible printed circuit panel. This continuous flexible printed circuit substrate is then coupled to a precisely positioned indexing system. Next, the front metal foil capacitive electrodes are coated with a light transmissive electrically conductive layer.

Abstract: A method of removing contaminants from a silicon wafer after chemical-mechanical polishing (CMP). After a copper chemical-mechanical polishing and a subsequent barrier chemical-mechanical polishing operation, an aqueous solution of ozone in de-ionized water is applied to clean the silicon wafer so that contaminants on the wafer are removed. Alternatively, an ozone/de-ionized water buffer-polishing process is conducted after copper and barrier CMP and then the wafer is cleaned using a chemical solution or de-ionized water. Alternatively, an ozone/de-ionized water buffer-polishing process is conducted after both copper-CMP and barrier-CMP and then the wafer is cleaned using a chemical solution or de-ionized water.

Abstract: A method of cleaning a dual damascene structure. A first metal layer, a cap layer, and a dielectric layer are formed on a substrate in sequence. Then a dual damascene opening is formed in the dielectric layer and the cap layer, exposing the first metal layer. Then, a post-etching cleaning step is carried out to clean the dual damascene opening, and there are two types of cleaning methods. The first method uses a fluorine-based solvent to clean the dual damascene opening. An alternative cleaning method uses a hydrogen peroxide based solvent at a high temperature, followed by a hydrofluoric acid solvent cleaning step. Then, an argon gas plasma is sputtered to clean the dual damascene opening before a second metal layer fills in the dual damascene opening.

Abstract: A wrench having two driving stems pivotally connected with each other. One of the driving stems has a main stem and a female joint protruding from a rectangular or cylindrical section of the main stem with a hole at a center thereof. The other driving stem has the other main stem and a male joint projecting out of the center of a rectangular or cylindrical section of the main stem. The male joint and the female joint are engaged with each other via a coupler such as a roll pin. Therefore, without using an additional hinge or other mechanical coupler, these two driving stems are pivotally connected with each other.

Abstract: A double-triggered electrostatic discharge (ESD) protection circuit for coupling with a first voltage source and a second voltage source. The circuit includes a diode series and a transistor. The diode series comprises a plurality of serially connected diodes with the cathode of one diode connected to the anode of a subsequent diode. The positive terminal of the first diode in the diode series connects with the first voltage source. The gate terminal of the transistor connects with the anode of the last diode in the diode series. The substrate of the transistor connects with the cathode of the last diode in the diode series. The source terminal and the drain terminal of the transistor connect with the first voltage source and the second voltage source, respectively. By using double-triggered design, the ESD clamp device can be quickly triggered on to bypass ESD current.

Abstract: A method of conducting a laser repair operation. A silicon wafer has a plurality of chips thereon. Each chip has a plurality of bonding pads, a plurality of testing pads, a plurality of fuses and a passivation layer for protecting the chip. The passivation layer exposes the bonding pads and the testing pads. A bump-forming process is conducted to form a bottom metallic layer and a bump sequentially over each bonding pad. Only a bottom metallic layer is formed over each testing pad. The bumps axe formed, for example, by electroplating or printing. Testing is carried out by probing various bottom metallic layers above the testing pads. Finally, a laser repair is conducted.

Abstract: A method of conducting a laser repair operation. A silicon wafer has a plurality of chips thereon. Each chip has a plurality of bonding pads, a plurality of testing pads, a plurality of fuses and a passivation layer for protecting the chip. The passivation layer exposes the bonding pads an the testing pads. A bump-forming process is conducted to form a bottom metallic layer and a bump sequentially over each bonding pad. Only a bottom metallic layer is formed over each testing pad. The bumps are formed, for example, by electroplating or printing. Testing is carried out by probing various bottom metallic layers above the testing pads. Finally, a laser repair is conducted.

Abstract: A tape-out system of a mask tooling network for multiple supply chain. The tape-out system includes an integrated circuit (IC) designer computer, a design service computer, and a mask house computer; wherein the IC designer computer, the design service computer and the mask house computer are the multi-users for the tape-out system. A network connects the IC designer computer, the design service computer and the mask house computer. A device design data and a product mask data are provided through the network from the IC designer computer to the design service computer. The device design data and the product mask data undergo a processing step and a summarizing step, so that a product mask tooling data is obtained, which is then transmitted through the network to the mark house computer and the IC designer computer. The mask house computer fabricates a mask in accordance with the product mask tooling data.

Abstract: A double-bit non-volatile memory cell structure and a method of programming the memory cell. The memory cell includes a pair of stacked gates above a substrate, a doped region in the substrate between the stacked gate pair and a source/drain region in the substrate on each side of the stacked gate pair. The source/drain regions and the doped region are doped identically. To write data into the memory cell, the channel underneath both stacked gates is opened simultaneously. Data is written into the desired floating gate by controlling current flow direction. To read data from a first floating gate of the memory cell, a read bias voltage is applied to the first control gate above the first floating gate. In the meantime, a transfer voltage is applied to the second control gate. The presence or the absence of a conductive channel between the source/drain regions indicates whether data has been written into the first floating gate or not.

Abstract: A method of correcting an optical mask pattern. A third pattern having a first strip-like pattern and a second strip-like pattern is provided. The first strip-like pattern attaches to the mid-section of the second strip-like pattern. A first modification step is conducted. A pair of assistant patterns is added to the respective sides of the first strip-like pattern to form a first modified pattern. A second modification step is conducted to shrink a portion of the first strip-like pattern to form a second modified pattern. Dimension in the reduced portion of the first strip-like pattern is a critical dimension of a main pattern. A third modification step is conducted using an optical proximity correction method. The second modified pattern is modified to a third modified pattern.