Abstract: A novel growth procedure to grow epitaxial Group III metal nitride thin films on lattice-mismatched substrates is proposed. Demonstrated are the quality improvement of epitaxial GaN layers using a pure metallic Ga buffer layer on c-plane sapphire substrate. X-ray rocking curve results indicate that the layers had excellent structural properties. The electron Hall mobility increases to an outstandingly high value of &mgr;>400 cm2/Vs for an electron background concentration of 4×1017 cm−3.
Type:
Grant
Filed:
April 2, 2001
Date of Patent:
May 13, 2003
Assignee:
The Regents of the University of California
Inventors:
Eicke R. Weber, Sudhir G. Subramanya, Yihwan Kim, Joachim Kruger