Abstract: A process for preparing a haloalkane comprising: (a) contacting a haloalkane starting material with an alkene in the presence of an effective amount of a catalyst complex under conditions effective to facilitate an addition reaction and to form a product stream comprising a haloalkane product from the addition reaction, wherein the catalyst complex has a boiling point higher than that of the haloalkane product; and (b) recovering the haloalkane product from the product stream.
Abstract: A method comprising etching a material under plasma etching conditions using an etching composition which has a GWP of no greater than about 3000 and which comprises at least one etchant compound having a formula selected from the group consisting of F—CO—[(CR1R2)m—CO]n—F and F—CO—R3—CO—F, and wherein:
m=0, 1, 2, 3, 4, or 5;
n=1;
R1 & R2 represent H, F or CxHyFz; wherein:
x=1 or 2; and
y+z=2x+1;
R3 represents CR4═CR5, R6R7C═C or C≡C; wherein:
R4-7 represent H, F, or CxHyFz; wherein:
x=1 or 2; and
y+z=2x+1;
and also including the cleaning of a surface by use of an etchant compound, and further including an etching composition which includes said etchant compound and also an etchant-modifier.
Type:
Grant
Filed:
December 31, 1997
Date of Patent:
October 21, 2003
Assignee:
AlliedSignal Inc.
Inventors:
Timothy R. Demmin, Matthew H. Luly, Mohammed A. Fathimulla
Abstract: A process for preparing 1-chloro-1,1,3,3,3-pentafluoropropane, CF3CH2CF2Cl, comprising contacting in a reaction zone in the substantial absence of oxygen, reactants comprising chlorine and 1,1,1,3,3-pentafluoropropane, CF3CH2CHF2 (also referred to as HFC-245fa), and subjecting the reactants to actinic radiation, such as UV light at about 2,000 to 4,000 Angstroms, wherein: (1) inert gas is present at a concentration equal to or less than about 5 wt. % of the total weight of reactants; (2) the molar ratio of chlorine to CF3CH2CHF2 is from about 0.2:1 to about 1.5:1; and (3) the concentration of chlorinated product produced having greater than one chlorine present in the molecule is less than or equal to about 10 wt. %.
Type:
Grant
Filed:
November 27, 2001
Date of Patent:
April 22, 2003
Assignee:
Honeywell International
Inventors:
Haridasan K. Nair, Michael Van Der Puy, David Nalewajek, Timothy R. Demmin, Andrew J. Poss, David E. Bradley, Ian R. Shankland, Martin E. Cheney
Abstract: The invention relates to a novel process for purifying HCFC-123 and HCFC-124 comprising:(a) reacting a fluorination reaction product comprising HCFC-123 and HCFC-123a and/or HCFC-124 and HCFC-124a wherein at least one of said HCFC-123a or HCFC-124a is present in an amount not less than 5 weight percent relative to HCFC-123 or HCFC-124 respectively in the product with anhydrous HF in the presence of a fluorination catalyst under conditions such that the amount of HCFC-123a and/or HCFC-124a relative to HCFC-123 and/or HCFC-124 respectively in the product is reduced to less than 5 weight percent.The pure product (i.e., HCFC-123 or HCFC-124) may be used in a variety of applications including solvent, refrigerant, sterilant gas and blowing agent applications.