Patents Represented by Attorney Craig P. Opperman
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Patent number: 7487210Abstract: A method of communication that includes causing user identifiers to be displayed in a group or panel that has been previously created by the first user by selecting user identifiers of potential callees from a list, and further including user identifier information for the second user retrieved over at least one network is disclosed.Type: GrantFiled: January 12, 2007Date of Patent: February 3, 2009Assignee: Avistar Communications CorporationInventors: Lester F. Ludwig, J. Chris Lauwers, Keith A. Lantz, Gerald J. Burnett, Emmett R. Burns
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Patent number: 5582553Abstract: A metal wood golf club head includes a hollow body with a front wall and a lower face, and a separate sole plate for securing across the lower face to form a lower wall of the head. The body has an internal cavity and an opening in the lower face leading into the cavity over which the sole plate extends. The sole plate is secured across the lower face by a suitable securing device. The front wall has an extended portion extending downwardly beyond the lower face against which the sole plate abuts when secured across the lower face.Type: GrantFiled: July 5, 1994Date of Patent: December 10, 1996Assignee: Goldwin Golf U.S.A., Inc.Inventors: Danny C. Ashcraft, Richard De La Cruz, Richard E. Parente
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Patent number: 5579718Abstract: An improved slit valve door for sealing an aperture in the wall of a semiconductor process chamber. The slit valve door consists of an aperture cover plate with a recess in it for receiving a removable insert. An O-ring seal is placed over the insert, and when the insert is placed in the recess of the aperture cover plate, the O-ring moves into an O-ring seat in the aperture cover plate. As the insert seats in the recess and is secured to the cover plate by means of screws protruding from the floor of the recess, a dovetail groove is formed which retains the O-ring.Type: GrantFiled: March 31, 1995Date of Patent: December 3, 1996Assignee: Applied Materials, Inc.Inventor: Fred Freerks
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Patent number: 5556476Abstract: A substrate processing apparatus comprising a housing defining a processing chamber for receiving a substrate therein. Inside the chamber a substrate supporting susceptor, including an upper substrate receiving portion is located. The receiving portion defines a walled pocket dimensioned to receive the substrate therein. When the substrate is so received the walls of the pocket define an annulus with the outer edge of the substrate. Typically the pocket walls are perpendicular to a primary plane of the substrate and are at least as high, and preferably twice as high, as the substrate is thick. At the outer, circumferential edge of the pocket a gas manifold is formed. The manifold is arranged so that, during processing, a gas which can be projected toward the edge of a substrate received in the pocket. This gas moves upwards between the annulus defined between the wall of the pocket and the outer edge of the substrate, thereby preventing processing gas from contacting the edge portion of the substrate.Type: GrantFiled: October 21, 1994Date of Patent: September 17, 1996Assignee: Applied Materials, Inc.Inventors: Lawrence C. Lei, Cissy Leung
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Patent number: 5556248Abstract: A semiconductor cassette and transfer system for facilitating the direct loading and unloading of wafers from different sides of a cassette by a first robot handling device moveable along a first extension axis and second robot handling device moveable along a second extension axis intersecting said first extension axis at an acute angle, and at a predetermined point concurrent with the center of the cassette as it is disposed in a fixed position within a loadlock chamber of a wafer processing apparatus.Type: GrantFiled: January 30, 1995Date of Patent: September 17, 1996Assignee: Applied Materials, Inc.Inventor: Howard E. Grunes
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Patent number: 5476548Abstract: A substrate processing apparatus for processing a substrate having a peripheral edge, an upper surface for processing and a lower surface lying on a support. The apparatus includes a processing chamber which houses the substrate support, in the form of a heater pedestal including a substrate receiving surface for receiving the lower surface of the substrate. A circumscribing shadow ring is located around the pedestal to cover peripheral edge portion of the substrate. The shadow ring also defines a cavity, between itself and the pedestal, at the peripheral edge of the substrate. In operation, the chamber receives processing gas at a first pressure and purge gas is introduced into the cavity, between the ring and the pedestal, at a second pressure which is greater than the first pressure. Fluid conduits are provided to enhance the flow of the purge gas away from the peripheral edge of the substrate.Type: GrantFiled: June 20, 1994Date of Patent: December 19, 1995Assignee: Applied Materials, Inc.Inventors: Lawrence C. Lei, Cissy S. Leung, Eric A. Englhardt, Ashok K. Sinha
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Patent number: 5437757Abstract: A clamp ring for use in a thermal reactor for processing a semiconductor wafer. The reactor includes a domed pedestal for supporting the wafer and controlling its temperature, and a clamp ring which includes an annular seat formed therein, for receiving and holding down the periphery of the wafer onto the domed pedestal. The seat formed in the clamp ring supports a ring of spheres which, in operation, engage and hold down the periphery of the wafer. Each sphere is rotationally supported in a pocket formed in the body of the clamp ring. A portion of each sphere protrudes beyond the seat so that the wafer's surface is contacted by the convex surface of the sphere. This keeps the wafer's surface and any sharp edges on the seat apart, thereby reducing damage of the wafer's surface by the seat. As the spheres are able to rotate in the pockets and therefore roll on the surface of the wafer, the chances of the damaging the wafer's surface are further reduced.Type: GrantFiled: January 21, 1994Date of Patent: August 1, 1995Assignee: Applied Materials, Inc.Inventors: Michael Rice, Jon Mohn
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Patent number: 5421893Abstract: A thermal reaction chamber for semiconductor wafer processing operations comprising:(i) a susceptor for supporting a semiconductor wafer within the chamber and having a plurality of apertures formed vertically therethrough;(ii) displacer means for displacing the susceptor vertically between at least a first and a second position;(iii) a plurality of wafer support elements, each of which is suspended to be vertically moveable within said apertures and each of which extends beyond the underside of the susceptor; and(iv) means for restricting the downward movement of the wafer support elements. As the susceptor is displaced from its first position through an intermediate position before the second position, the means for restricting operate to stop the continued downward movement of the wafer support elements thereby causing the elements to move vertically upwards with respect to the downwardly moving susceptor and separate the wafer from the susceptor.Type: GrantFiled: November 29, 1993Date of Patent: June 6, 1995Assignee: Applied Materials, Inc.Inventor: Ilya Perlov
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Patent number: 5387067Abstract: A semiconductor cassetteand transfer system for facilitating the direct loading and unloading of wafers from different sides of a cassette by a first robot handling means moveable along a first extension axis and second robot handling means moveable along a second extension axis intersecting said first extension axis at an acute angle, and at a predetermined point concurrent with the center of the cassetteas it is disposed in a fixed position within a loadlock chamber of a wafer processing apparatus.Type: GrantFiled: January 14, 1993Date of Patent: February 7, 1995Assignee: Applied Materials, Inc.Inventor: Howard E. Grunes
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Patent number: 5332443Abstract: A substrate lifting apparatus for use in a substrate processing apparatus which includes a thermal reactor having a substrate processing chamber and a substrate support located in the chamber. The lifting apparatus consists of a generally circular shaped support with four seats formed therein; four substrate lifting elements, each having a substrate engaging end and a securing tab sized to be received in a seat; a fastener, associated with each lifting element, which secures the tab into the seat; and an adjuster, associated with each lifting element, located between the tab and the seat. When the tab is secured in the seat and the adjuster is operated, the lifting element is caused to move in a plane parallel to a plane formed through the center of the fastener and the adjuster.Type: GrantFiled: June 9, 1993Date of Patent: July 26, 1994Assignee: Applied Materials, Inc.Inventors: Sandy M.-S. Chew, Shane D. Clark, Ron L. Rose, Dale R. DuBois, Cissy Leung, Alan F. Morrison, Manus K. Wong
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Patent number: 5275303Abstract: This invention provides a closure means for an aperture in a semiconductor deposition furnace, the closure means including an aperture cover plate; at least one articulated linkage including at least two arms, the arms being pivotally mounted with respect to each other to define an angle between them such that variation of the angle causes the plate to move between an aperture closing position and an open position in which the plate is clear of the aperture; and an actuator for driving the articulated linkage and for locking the plate in the aperture closing position. The articulated linkage is in the form of a first arm connected to the cover plate, and a second arm for transferring motive force from the actuator to the first arm. As the plate is moved from its open position to its aperture closing position, the angle between the first and second arms changes from a relatively small angle to a relatively large angle.Type: GrantFiled: February 3, 1992Date of Patent: January 4, 1994Assignee: Applied Materials, Inc.Inventor: Laszlo Szalai
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Patent number: 5266923Abstract: An improved locking mechanism having a first electrode carried by at least one of the locking elements and a second electrode carried by the locking surface normally engageable by the locking elements when the locking mechanism is in its locked configuration, and an electrical tamper-detection circuit connected across the first and second electrodes and operative to generate an electrical signal response in the event that the first electrode is caused to engage the second electrode.Type: GrantFiled: April 25, 1991Date of Patent: November 30, 1993Inventor: Chiang S. Tseng
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Patent number: D378111Type: GrantFiled: July 5, 1994Date of Patent: February 18, 1997Assignee: Goldwin Golf U.S.A., Inc.Inventors: Richard E. Parente, Richard De La Cruz, Danny C. Ashcraft