Abstract: A light-emitting semiconductor device includes a sapphire substrate whose main surface orientation is tilted by 1 to 4 degrees from its axis "a" <1120>, and layers epitaxially formed thereon. Tilting the surface orientation of the sapphire substrate enables uniform doping of a p-type impurity into the layers epitaxially grown thereon. As a result, the luminous intensity of the light-emitting semiconductor device is improved.
Type:
Grant
Filed:
April 19, 1995
Date of Patent:
December 24, 1996
Assignees:
Toyoda Gosei Co., Ltd., Research Development Corporation of Japan