Abstract: The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.
Type:
Grant
Filed:
April 8, 2003
Date of Patent:
December 6, 2005
Assignee:
Cymer, Inc.
Inventors:
Stephan T. Melnychuk, William N. Partlo, Igor V. Fomenkov, I. Roger Oliver, Richard M. Ness, Norbert Bowering, Oleh Khodykin, Curtis L. Rettig, Gerry M. Blumenstock, Timothy S. Dyer, Rodney D. Simmons, Jerzy R. Hoffman, R. Mark Johnson