Abstract: A wheelbarrow including a first lever providing at least one handle rigidly coupled to a second lever providing a bucket for carrying a payload. A lever assembly rigidly coupled to the second lever.
Abstract: A multilayer reflective optic or mirror for lithographic applications, and particularly extreme ultraviolet (EUV) lithography, having a surface or “capping” layer which in combination with incident radiation and gaseous molecular species such as O2, H2, H2O provides for continuous cleaning of carbon deposits from the optic surface. The metal capping layer is required to be oxidation resistant and capable of transmitting at least 90% of incident EUV radiation. Materials for the capping layer include Ru, Rh, Pd, Ir, Pt and Au and combinations thereof.
Type:
Grant
Filed:
January 3, 2001
Date of Patent:
December 16, 2003
Assignee:
EUV LLC
Inventors:
Leonard E. Klebanoff, Richard H. Stulen
Abstract: A flow barrier disposed at the periphery of a workpiece for achieving uniform reaction across the surface of the workpiece, such as a semiconductor wafer, in a stagnation flow reactor operating under the conditions of a low pressure or low flow rate. The flow barrier is preferably in the shape of annulus and can include within the annular structure passages or flow channels for directing a secondary flow of gas substantially at the surface of a semiconductor workpiece. The flow barrier can be constructed of any material which is chemically inert to reactive gases flowing over the surface of the semiconductor workpiece.
Abstract: A method for repair of amplitude and/or phase defects in lithographic masks. The method involves modifying or altering a portion of the absorber pattern on the surface of the mask blank proximate to the mask defect to compensate for the local disturbance (amplitude or phase) of the optical field due to the defect.
Type:
Grant
Filed:
December 8, 1998
Date of Patent:
May 22, 2001
Assignee:
EUV LLC
Inventors:
Donald W. Sweeney, Avijit K. Ray-Chaudhuri
Abstract: A gas and radiation are used to produce a protective coating that is substantially void-free on the molecular scale, self-terminating, and degradation resistant. The process can be used to deposit very thin (≈5-20 Å) coatings on critical surfaces needing protection from degradative processes including, corrosion and contamination.
Abstract: A new channel structure for microfluidic systems and process for fabricating this structure. In contrast to the conventional practice of fabricating fluid channels as trenches or grooves in a substrate, fluid channels are fabricated as thin walled raised structures on a substrate. Microfluidic devices produced in accordance with the invention are a hybrid assembly generally consisting of three layers: 1) a substrate that can or cannot be an electrical insulator; 2) a middle layer, that is an electrically conducting material and preferably silicon, forms the channel walls whose height defines the channel height, joined to and extending from the substrate; and 3) a top layer, joined to the top of the channels, that forms a cover for the channels. The channels can be defined by photolithographic techniques and are produced by etching away the material around the channel walls.
Type:
Grant
Filed:
September 23, 1999
Date of Patent:
April 3, 2001
Assignee:
Sandia Corporation
Inventors:
Don W. Arnold, Joseph S. Schoeniger, Gregory F. Cardinale
Abstract: A method and apparatus for efficiently and rapidly mixing liquids in a system operating in the creeping flow regime such as would be encountered in capillary-based systems. By applying an electric field to each liquid, the present invention is capable of mixing together fluid streams in capillary-based systems, where mechanical or turbulent stirring cannot be used, to produce a homogeneous liquid.
Abstract: Apparatus and method for improving the resolution of non-pressure driven capillary chromatographic systems, and particularly for capillary electrochromatography (CEC) systems. By reducing the cross-sectional area of a packed capillary column by means of a second open capillary contiguous with the outlet end of a packed capillary column, where the packed capillary column has a cross sectional area of between about 2 and 5 times that of the open capillary column, the phenomenon of band broadening in the transition region between the open capillary and the packed capillary column, where the individual components of the mixture are analyzed, can be eliminated, thereby providing for a significant improvement in resolution and more accurate detection and analysis.
Type:
Grant
Filed:
October 29, 1998
Date of Patent:
May 30, 2000
Assignee:
Sandia Corporation
Inventors:
Michael G. Garguilo, Phillip H. Paul, David J. Rakestraw