Abstract: The present invention provides novel copolymers and photoresist compositions that contain such copolymers as a resin binder component. Preferred copolymers include three distinct repeating units: 1) units that contain acid-labile groups; 2) units that are free of both reactive and hydroxy moieties; and 3) units that contribute to aqueous developability of a photoresist containing the copolymer as a resin binder. Photoresists of the invention exhibit surprising lithographic improvements including substantially enhanced plasma etch resistance and isolated line performance as well as good dissolution rate control.

Abstract: Methods for preparing uniformly sized polymer particles comprised of multi-functional monomers such as poly(1,4-butanediol diacrylate) and poly(1,6-hexanediol diacrylate) are disclosed. The particles are of a size, uniformity, and contan physical characteristics that make them ideally suitable for use as spacers in liquid crystal display devices.