Abstract: A wirebond structure includes a copper pad formed on or in a surface of a microelectronic die. A conductive layer is included in contact with the copper pad and a bond wire is bonded to the conductive layer. The conductive layer is formed of a material to provide a stable contact between the bond wire and the copper pad in at least one of an oxidizing environment and an environment with temperatures up to at least about 350° C.
Type:
Grant
Filed:
December 1, 2004
Date of Patent:
July 1, 2008
Assignee:
Intel Corporation
Inventors:
Robert J. Gleixner, Donald Danielson, Patrick M. Paluda, Rajan Naik