Abstract: In the prior art, selective epitaxial growth (SEG) of semiconductors, performed typically in rectangular windows penetrating through a masking layer located on a major surface of semiconductor substrate, suffers from unwanted facet formation at the corners of the windows--whereby the desirable planar area available for transistor fabrication is reduced. Such facet formation is suppressed--i.e., the area occupied by unwanted facets is reduced--by adding a relatively small lobe penetrating through the masking layer at each corner of each window prior to performing the SEG, whereby transistor packing density can be increased.

Abstract: A radial type of high voltage solid-state switch is essentially a gated diode switch (GDS) with portions of the anode, cathode, shield, and gate regions being arc portions of concentric circles which have different radii. The arc length and radius of the arc portions of the anode are less than the corresponding parameters of the shield and cathode. This structure, which is denoted as a radial gated diode switch, RGDS, has lower on resistance than a standard GDS of the same area and distance between anode and shield regions.