Patents Represented by Attorney Donald E. Verplancken

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  • Electrically floating shield in a plasma reactor
    Patent number: 5736021
    Abstract: In a plasma reactor, especially one intended for physical vapor deposition (PVD) onto semiconductor substrates, a shield disposed in front of the chamber walls between the PVD target and the substrates to protect the chamber walls. According to the invention, the shield is left electrically floating so that electrically charged ions and electrons emanating from the plasma or target and impinging upon the shield charge it to the point that the electrical flux is repelled.
    Type: Grant
    Filed: July 10, 1996
    Date of Patent: April 7, 1998
    Assignee: Applied Materials, Inc.
    Inventors: Peijun Ding, Zheng Xu, Jianming Fu