Abstract: A superconducting oxide precursor material is prepared by dissolving soluble compounds containing the non-oxygen elements of the oxide in concentrated nitric acid, in which a decomposing agent for the nitrate of the nitric acid selected from urea and sucrose and an oxidizing/reducing agent selected from hydrogen peroxide and ammonium nitrate have also been dissolved. The acid solution is concentrated by heating until the liquid component is pyrolyzed, leaving a superconducting oxide precursor material residue. The precursor material is produced with a relatively high oxidation state, but is normally further oxidized to reach a superconducting state.

Abstract: A T-gate structure (28a) is fabricated on a microelectronic device substrate (10) using a trilevel resist system in combination with a two-step reactive ion etching (RIE) technique utilizing an oxygen plasma. The trilevel resist consists of a planarizing resist layer (12), masking layer (14) and imaging resist layer (16), which are formed on the surface (10a) of the substrate (10). A focused ion beam (18) is then used to expose the uppermost imaging layer (16) with an image having a width equal to the desired gate length of the T-gate structure (28a). The imaged area is developed and etched to form an opening (14a,16a) of the same width through the imaging layer (16) and also through the masking layer (14). In the first oxygen RIE step, the planarizing resist layer (12) is etched isotropically through the opening (14a,16a), partially down to the substrate surface (10a) to form a cavity (12a) having a width which is larger than the width of the opening (14a,16a).

Abstract: A molecular beam epitaxy (MBE) growth method and apparatus is disclosed which achieves a significantly improved sticking coefficient for materials like Hg upon a substrate, and thus a higher efficiency. A highly ionized, low pressure plasma is formed consisting of a mixture of ions of one substance of a compound to be epitaxially grown, neutral particles of the substance and electrons, and also preferably both ionization and excitation radiation. The plasma is directed onto a substrate together with a flux of the other substance in the compound; the flux can be in the form of either a vapor, or a second plasma. Radiation assisted epitaxial growth for Hg compounds in which ionization and excitation radiation are formed from Hg vapor and used to assist epitaxial growth with neutral Hg particles is also described. The plasma is formed in a special discharge chamber having a hollow cathode with an emissive-mix-free cathode insert.

Abstract: A plurality of field effect transistors (FETS) (Q.sub.0 A to Q.sub.n-1 A, and Q.sub.0 B to Q.sub.n-1 B) are arranged in a structure (10) to normally perform a first logic function such as NAND. Selectively implanting the channel region (38) of at least one of the FETs (30) with sufficient ions of a predetermined ion species such that the respective FET (30) maintains a constant logic state (constantly turned ON or OFF) for all logical values of applied gate voltage converts the structure (10) to perform a second logic function such as NOR. Alternatively, one of the logic states may be "stuck high" (constant logical high output) or "stuck low" (constant logical low output). The channel implants are substantially undetectable, rendering the structure (10) highly resistant to reverse engineering.

Abstract: A high concentration of diatomic molecules is caged in a host crystal by a crystal growth process, in which all other internal degrees of freedom of the diatomic molecule, except the vibrational, are frozen. Such a system provides an efficient mid-infrared, solid-state laser that can be pumped by a laser diode. Other uses include magnetic (Faraday) rotators, electro-optic switches, and Q-switches. The crystal growth process employs Czochralski-type or Bridgman-type processes under high pressure to introduce the diatomic molecule into the host lattice at a temperature slightly above the melting point of the host crystal, followed by slow cooling.

Abstract: Post-growth gas-impregnation of an ionic crystal is provided to achieve a high level of caged neutral diatomic species or charged diatomic species, where all other internal degrees of freedom of the species, except the vibrational, are frozen. In the former case, the neutral diatomic species (molecules) enter interstitially, while in the latter case, the charged diatomic species (anions) substitute for anions on the crystal lattice. Such a system provides an efficient mid-infrared, solid-state laser that can be pumped by a laser diode. Other uses include magnetic (Faraday) rotators, electro-optic switches, and Q-switches. The impregnation process introduces the species into the host lattice at a temperature below the melting point of the host crystal, and preferably at a phase transition of the crystal, followed by slow cooling.

Abstract: A miniature electrostatically actuated switch and process for fabricating it in which the switch is operable to connect and disconnect one or more transmission lines laid down on a dielectric substrate of an integrated circuit wafer. The switch is fabricated on the integrated circuit wafer using integrated circuit fabrication processes including thin films of conductive materials and photoresist and selective removal of these films. the switch includes a rotating switch blade which rotates about a hub formed on the dielectric substrate under the influence of electrostatic fields created by control pads and other switch elements formed on the dielectric substrate, whereupon a microwave signal can be switchably transmitted along the transmission line formed on the substrate.

Abstract: An oxide superconductor having a high critical temperature is provided with a passivation coating comprising a first layer of a Group II oxide, such as magnesium oxide, and a second layer of a polymer, such as polyimide. The Group II oxide is formed under conditions to be substantially amorphous. After depositing the Group II layer, the encapsulated superconductor is heated to an elevated temperature for a period of time in an oxidizing atmosphere. This restores the high critical temperature to its original value. The polymer is then coated on top of the Group II oxide and cured. The passivation coating is resistant to strong acids, strong bases, and water, is robust, hard, and resilient against scratching.