Patents Represented by Attorney EcoTech Law Group, P.C.
  • Patent number: 8138482
    Abstract: A process for evaluating a cleaning solution is described. The process includes: (i) subjecting a solution, including a solute and a solvent, to sonic energy to create a sonicated solution; (ii) measuring UV absorption of the sonicated solution to produce a sample UV absorbance spectra; (iii) obtaining a reference solution, which includes a solute concentration that is similar to that of solute concentration in the sonicated solution; (iv) measuring UV absorption of the reference solution to produce a reference UV absorbance spectra; (v) scaling the reference UV absorbance spectra to the sample UV absorbance spectra at a lower range of the UV spectrum; (vi) subtracting from the reference UV absorbance spectra the sample UV absorbance spectra to produce a differential UV spectra; and (vii) evaluating at or near a peak of the sample UV absorbance spectra the differential UV absorbance spectra to determine whether the sonicated solution is activated.
    Type: Grant
    Filed: May 23, 2008
    Date of Patent: March 20, 2012
    Assignee: Nano Green Technology, Inc.
    Inventors: Ariel Flat, Suraj Puri
  • Patent number: 8092678
    Abstract: A method of wastewater treatment is described. The method includes: (i) receiving wastewater; (ii) performing a first type of treatment on wastewater to produce wastewater having a first property which is capable of changing; (iii) preventing the first property from changing; (iv) performing a second type of treatment on wastewater; and wherein the first property includes at least one property selected from a group consisting of biochemical oxygen demand (“BOD”) level, dissolved oxygen level, solid content and nutrient level.
    Type: Grant
    Filed: July 15, 2008
    Date of Patent: January 10, 2012
    Assignee: Protech Services, Inc.
    Inventor: Christopher Ott
  • Patent number: 7959411
    Abstract: A generally spherical turbine configured to rotate transversely within a cylindrical pipe under the power of fluid flowing either direction therethrough is operatively coupled with a rotating machine or generator to produce electricity. In one embodiment, the blades of the spherical turbine curve in an approximately 180 degree arc in a plane that is at an inclined angle relative to the rotational axis of a central shaft. In another embodiment, a deflector is provided upstream of the spherical turbine and within the cylindrical pipe to control flow through the spherical turbine by shielding a part thereof. The blades of the spherical turbine are airfoil in cross section to optimize hydrodynamic flow, to minimize cavitation, and to maximize conversion from axial to rotating energy.
    Type: Grant
    Filed: April 7, 2009
    Date of Patent: June 14, 2011
    Assignees: Northwest Pipe Company, Lucid Energy Technologies, LLP
    Inventors: Roderic A. Schlabach, Mark Rydell Cosby, Edward Kurth, Igor Palley, Greg Smith
  • Patent number: 7914624
    Abstract: Inventive methods, systems and compositions of cleaning integrated circuit (“IC”) substrates are described. The cleaning methods of the present invention include: charging a solution, which contains at least a solute selected to promote cleaning of the IC substrate, to produce a charged solution, such that at least a portion of the solute is present as clusters in the charged solution; and conveying the charged solution for cleaning the IC substrate. The cleaning systems of the present invention include: a charging chamber for holding a solution, which contains at least a solute selected to promote cleaning of the integrated circuit substrate; and a first acoustic energy source capable of vibrating the solution in the charging chamber to produce a charged solution such that at least a portion of the solute is present as clusters in the charged solution.
    Type: Grant
    Filed: July 15, 2009
    Date of Patent: March 29, 2011
    Assignee: Nano OM, LLC
    Inventor: Suraj Puri
  • Patent number: 7731800
    Abstract: Inventive methods and systems of cleaning patterned integrated circuit (“IC”) substrates are described. The cleaning methods of the present invention include: (1) providing the patterned integrated circuit substrate having thereon poly silicon lines adjacent to each other; (2) charging a solution, which contains at least a solute selected to promote cleaning of the patterned integrated circuit substrate, to produce a charged solution, wherein at least a portion of the solute is present as clusters in the charged solution; and (3) conveying the charged solution for cleaning the patterned integrated circuit substrate.
    Type: Grant
    Filed: March 29, 2005
    Date of Patent: June 8, 2010
    Assignee: Nano OM, LLC
    Inventor: Suraj Puri
  • Patent number: 7655094
    Abstract: Inventive methods, systems and compositions of cleaning integrated circuit (“IC”) substrates are described. The cleaning methods of the present invention include: charging a solution, which contains at least a solute selected to promote cleaning of the IC substrate, to produce a charged solution, such that at least a portion of the solute is present as clusters in the charged solution; and conveying the charged solution for cleaning the IC substrate.
    Type: Grant
    Filed: July 7, 2004
    Date of Patent: February 2, 2010
    Assignee: Nano Om, LLC
    Inventor: Suraj Puri