Patents Represented by Attorney Edward C. Waltersheid
  • Patent number: 4146449
    Abstract: Impurities such as PH.sub.3, AsH.sub.3, and B.sub.2 H.sub.6 may be removed from SiH.sub.4 by means of selective photolysis with ultraviolet radiation of the appropriate wavelength. An ArF laser operating at 193 nm provides an efficient and effective radiation source for the photolysis.
    Type: Grant
    Filed: December 28, 1977
    Date of Patent: March 27, 1979
    Assignee: The United States of America as represented by the United States Department of Energy
    Inventors: John H. Clark, Robert G. Anderson