Abstract: A fluid-elastomeric damper assembly operable for damping relative motion between a first structure and a second structure including a housing structure grounded to the first structure and a plurality of elastomer seals coupled to the housing structure, the housing structure and the plurality of elastomer seals defining a fluid-elastomeric chamber operable for containing a fluid. The fluid-elastomeric damper assembly also including one or more piston structures disposed within the housing structure and the fluid-elastomeric chamber, the one or more piston structures grounded to the first structure and driven by the second structure, and the one or more piston structures each including a first substantially fluid-filled chamber and a second substantially-fluid-filled chamber in communication via an orifice, the first substantially fluid-filled chamber and the second substantially fluid-filled chamber also in communication with the fluid-elastomeric chamber.

Abstract: The invention provides a rotating tub washer with an on-off binary damper system for damping a problematic movement between the washer frame and the rotating tub. The on-off binary damper system has a friction pad and a housing friction damper surface, with the friction pad in contact with said housing friction damper surface.

Abstract: Tiltrotor aircraft drivelink includes a nonelastomeric outer drivelink member with a first linkend and a distal second linkend. The tiltrotor aircraft drivelink first linkend has a first linkend cavity with a first linkend cavity inner circumferential bonding surface, and a first linkend nonelastomeric inner member contained in the first linkend cavity, the first linkend nonelastomeric inner member having a first linkend outer circumferential bonding surface, and a first linkend elastomeric intermediate having an outer circumferential elastomeric bonding surface and an inner circumferential elastomeric bonding surface, the outer circumferential elastomeric bonding surface bonded to the first linkend cavity inner circumferential bonding surface and the inner circumferential elastomeric bonding surface bonded to the first linkend outer circumferential bonding surface, the elastomeric intermediate containing N nonelastomeric outboard bonded shims and no more than N?1 nonelastomeric inboard bonded shims.

Abstract: The invention provides an aircraft with an auxiliary power unit isolated from the aircraft. An auxiliary power unit suspension system includes at least one suspension linkage. The suspension linkage terminates with a first low stiffness elastomeric rod end. The low stiffness elastomeric rod end has a low spring rate with the aircraft auxiliary power unit suspension system providing the aircraft auxiliary power unit with a suspended auxiliary power unit natural frequency, the suspended auxiliary power unit natural frequency below the aircraft auxiliary power unit operation frequency.

Abstract: The invention provides a rotary wing aircraft helicopter vehicle rod end and method of making a rod end. The rotary wing aircraft rod end includes a nonelastomeric inner member having an outer bonding surface segment and an axial bore with a center bore axis, a nonelastomeric outer member having an inner bonding surface segment and an axial bore center bore axis, and molded in place alternating elastomeric shims and nonelastomeric shims connecting the nonelastomeric inner member to the nonelastomeric outer member. The rod end includes a first inner elastomeric shim bonded to the nonelastomeric inner member outer bonding surface segment and to a first inner nonelastomeric shim and a second outer elastomeric shim bonded to the nonelastomeric outer member inner bonding surface segment and to a second outer nonelastomeric shim. The nonelastomeric inner member has a molded misalignment rotary wing aircraft rod end orientation with the outer nonelastomeric outer member.

Abstract: A moving tracks dozer equalizer link elastomeric bearing assembly including a concentric outer member operable for securely engaging a equalizer link bore structure associated with a first end portion of an equalizer link structural member, wherein the concentric outer member is disposed substantially within the equalizer link bore structure. The dozer equalizer link elastomeric bearing assembly also including a concentric inner member operable for securely engaging a pin structure associated with a second moving track roller frame assembly structural member, wherein the concentric inner member is disposed substantially within the concentric outer member.

Abstract: The controllable suspension system includes a strut with a magnetorheological fluid damper. The magnetorheological fluid damper includes a longitudinal damper tubular housing having a longitudinally extending axis and an inner wall for containing magnetorheological fluid.

Abstract: An equipment engine mounting system/method for mounting an equipment engine to an equipment frame. The equipment engine mounting system includes a first engine mount disposed between the equipment engine and the equipment frame, including a first engine mount nonextensible inner member having an outer bonding surface. The first engine mount including a first engine mount nonextensible outer member, the first engine mount nonextensible outer member having an inner bonding surface. The first engine mount includes an intermediate elastomer between the first engine mount nonextensible inner member and the first engine mount nonextensible outer member, the first engine mount intermediate elastomer bonded to the first engine mount nonextensible inner member outer bonding surface and the first engine mount nonextensible outer member inner bonding surface.

Abstract: A vehicle suspension system for large vehicles includes at least one elastomeric bearing. The bearing includes at least one substantially cylindrical elastomeric portion, at least one substantially frustospherical elastomeric portion, and at least one non-extensible shim disposed between and bonded to the substantially cylindrical elastomeric portion and the substantially frustospherical elastomeric portion.

Abstract: Helicopter rotating hub mounted vibration control system for a rotary wing hub having periodic vibrations while rotating at an operational rotation frequency. The vibration control system includes a housing attachable to the rotary wing hub and rotating with the hub at the operational frequency. The housing is centered about the rotary wing hub axis of rotation and has an electronics housing cavity subsystem and an adjacent rotor housing cavity subsystem. The rotor housing cavity contains a first coaxial ring motor with a first rotor and imbalance mass and a second coaxial ring motor with a second rotor and imbalance mass.

Abstract: The invention provides a UV below 200 nm lithography method utilizing mixed calcium strontium fluoride crystals. The invention includes providing a below 200 nm radiation source for producing <200-nm light, providing a plurality of mixed calcium strontium cubic fluoride crystal optical elements, with the fluoride crystals comprised of a combination of calcium strontium cations having different optical polarizabilities such as to produce an overall isotropic polarizability which minimizes the fluoride crystal spatial dispersion below 200 nm, transmitting <200-nm light through the cubic fluoride crystal optical elements, forming a lithography pattern with the light, reducing the lithography pattern and projecting the lithography pattern with the fluoride crystal optical elements onto a UV radiation sensitive lithography printing medium to form a printed lithographic pattern. The invention includes making the mixed fluoride crystals, optical element blanks thereof and optical lithography elements.

Abstract: The optical fluoride crystal treatment device of the invention includes a enclosure (12) separating the device from its external environment, heating means to heat and keep the internal volume (16) of said enclosure (12) at a predetermined temperature, at least one hollow platform (20) delimiting an internal chamber (22) whose upper wall (24) bears at least two independent diffusers (30) each delimiting a cavity (32) able to receive a unitary quantity (100) of said optical fluoride crystal substance, each of said cavities (32) communicating with said internal chamber (22) of the corresponding platform (20), a gas supply source containing said reactive gas, and means (50, 52, 54) for distributing said gas containing said reactive gas from said supply source to the inside of the internal chamber of each platform and having means (44) for regulating the pressure of said distributed gas.

Abstract: The present invention is a method of making a lithography photomask and photomask blank. The method of making the lithography photomask and photomask blank includes providing a silicon oxyfluoride glass tube having an OH content less than 50 ppm. The method further includes cutting the silicon oxyfluoride glass tube, flattening the silicon oxyfluoride glass tube, and forming the flattened cut silicon oxyfluoride glass tube into a photomask blank having a planar surface. The present invention includes a glass lithography mask preform. The glass lithography mask preform is a longitudinal silicon oxyfluoride glass tube that has an OH content ≦10 ppm, a F wt. % concentration ≧0.5 wt. %.

Abstract: A birefringence minimizing fluoride crystal vacuum ultraviolet (“VUV”) optical lithography lens element is provided for use with lithography wavelengths<230 nm. The VUV lithography lens element has an optical axis encompassed by a lens perimeter with the fluoride crystal lens having a variation in crystallographic orientation direction which tilts away from the optical center axis towards the lens perimeter to provide minimal birefringence. The invention includes a birefringence minimizing fluoride crystal optical lithography lens blank with a variation in crystallographic orientation direction across the blank.

Abstract: The invention provides a method of making UV<200 nm transmitting optical fluoride crystals for excimer laser lithography optics and a multicompartment container for growing optical fluoride crystals, comprising a number of graphite bowls that are placed on top of one another to form a stack and which have a central conical orifice in the bottom of each of them, and also comprising a seeding unit that has a central cylindrical orifice and is arranged under the lowermost bowl, characterized in the each bowl is fitted with a heat-removing device that is made in the form of a graphite cylinder with a central conical orifice, is mounted under the bottom of each bowl, and adjoins, with its other surface, the cover of the next bowl down, in which design the cover of each bowl, apart from the uppermost one, has a central conical orifice.

Abstract: The present invention provides below 160 nm optical lithography crystal materials for VUV optical lithography systems and processes. The invention provides fluoride optical lithography crystals for utilization in 157 nm optical microlithography elements which manipulate below 193 nm optical lithography photons. The present invention provides methods of making below 160 nm optical lithography crystal materials for below 160 nm VUV optical lithography systems and processes.

Abstract: The method of making optical fluoride crystal components provide optical components with beneficial final polished transmission surfaces for transmitting below 200 nm wavelengths of light, such as produced by excimer lasers and utilized in optical lithography. The invention utilizes colloidal silica soot in the polishing of optical fluoride crystal surfaces. This colloidal silica soot is a byproduct of chemical vapor deposition processing of fused silica or ultra low expansion glasses. The colloidal silica byproduct is referred to as “soot”. Retaining the same physical properties as the parent glass and having a spherical morphology, the colloidal silica soot is an ideal for final polishing applications of optical fluoride crystals, and particularly for optical fluoride crystals such as calcium fluoride which have high transmission levels to below 300 nm light such as produced by excimer lasers.

Abstract: The invention provides a UV below 200 nm lithography method. The invention includes providing a below 200 nm radiation source for producing <200-nm light, providing a plurality of mixed cubic fluoride crystal optical elements, with the fluoride crystals comprised of a combination of alkaline earth cations having different optical polarizabilities such as to produce an overall isotropic polarizability which minimizes the fluoride crystal spatial dispersion below 200 nm, transmitting <200-nm light through the cubic fluoride crystal optical elements, forming a lithography pattern with the light, reducing the lithography pattern and projecting the lithography pattern with the cubic fluoride crystal optical elements onto a UV radiation sensitive lithography printing medium to form a printed lithographic pattern. The invention includes making the mixed fluoride crystals and forming optical element therefrom.

Abstract: The present invention relates generally to UV (ultraviolet) photosensitive bulk glass, and particularly to batch meltable alkali boro-alumino-silicate glasses. The photosensitive bulk glass of the invention exhibits photosensitivity to UV wavelengths below 250 nm. The photosensitivity of the alkali boro-alumino-silicate bulk glass to UV wavelengths below 250 nm provide for the making of refractive index patterns in the glass. With a radiation source below 250 nm, such as a laser, refractive index patterns are formed in the glass. The inventive photosensitive optical refractive index pattern forming bulk glass allows for the formation of patterns in glass and devices which utilize such patterned glass.

Abstract: The present invention provides fluoride lens crystals for VUV optical lithography systems and processes. The invention provides a barium fluoride optical lithography crystal for utilization in 157 nm optical microlithography elements which manipulate below 193 nm optical lithography photons. The invention includes a barium fluoride crystalline material for use in dispersion management of below 160 nm optical lithography processes.