Patents Represented by Attorney, Agent or Law Firm Elizabeth Geschke
  • Deep-UV anti-reflective resist compositions
    Patent number: 6824952
    Abstract: A composition useful as a lift-off resist comprising at least one solvent, at least one polydimethylglutarimide (PMGI) resin and at least one selected deep-UV absorbing molecule of Formula I, where X is an aromatic or aliphatic bridging group, and Ar and Ar′ are aryl groups wherein at least one Ar or Ar′ contains one or more hydroxyl or carboxylic acid groups
    Type: Grant
    Filed: September 13, 2001
    Date of Patent: November 30, 2004
    Assignee: MicroChem Corp.
    Inventors: David W. Minsek, Daniel J. Nawrocki