Abstract: A compact, low current flash EPROM cell that is scaleable to dee-submicron levels for future generations of flash memory arrays is disclosed. This flash memory cell can be fabricated using a twelve masks, triple-poly, salicided process. Source-side injection for programming and poly-to-poly erasing demand very little current and power and such demand can easily be met by charge pump techniques. A select gate in series with the cell channel guarantees enhancement threshold and its sell-alignment and constant channel length will give uniform electrical characteristics in every respect. A virtual ground array fabricated using a self-aligned salicidation process provides a compact cell with high access speed. The cell area is approximately 3F.times.2F where F is a given minimum dimension.