Patents Represented by Attorney F. M. Sajovec
  • Patent number: 5005681
    Abstract: An overtravel brake system for a storage and retrieval system which is automatically actuated when the load carriage lift motor is deenergized and the load carriage moves downward. The brake system includes a dog mounted on the load carriage and engageable with the mast, the dog being actuated by a chain or cable which applies an actuating force to the dog actuating mechanism only after the load carriage has traveled a predetermined distance. The chain or cable is connected to the output member of a clutch mechanism operable in response to relative movement between the load carriage and the mast, and which is held in a disengaged condition when the lift motor is energized and is automatically shifted to an engaged condition when the lift motor is deenergized.
    Type: Grant
    Filed: December 20, 1989
    Date of Patent: April 9, 1991
    Assignee: Eaton-Kenway, Inc.
    Inventor: George R. Pipes
  • Patent number: 5005912
    Abstract: A wheel mounting assembly for a rail-supported storage/retrieval machine. The drive and idler wheels are each mounted on a removable module which includes a fixed plate having a concave spherical surface formed in it and movable plate to which the wheel is mounted having a convex spherical surface interfitting with the concave surface on the fixed plate to define a spherical joint. The plates are interconnected by bolts fitting loosely in oversize holes formed in the fixed plate and threaded into the movable plate to provide limited relative movement of the plates about a plurality of axes. Four jackscrews arranged in pairs on opposite sides of the movable plate are threaded through a frame holding the first plate and bear against the sides of the second plate. Simultaneous tightening and loosening among combinations of the four jackscrews provides horizontal and vertical alignment of the wheel relative to the rail on which the machine is supported.
    Type: Grant
    Filed: October 2, 1989
    Date of Patent: April 9, 1991
    Assignee: Eaton-Kenway, Inc.
    Inventor: George R. Pipes
  • Patent number: 4988262
    Abstract: A double reach shuttle assembly for a storage and retrieval machine. Latch mechanisms are provided on the movable elements of the shuttle to control the sequence of extension of the movable elements thereby reducing the amount of space required beneath a load in a storage rack to accommodate the shuttle elements when the double reach shuttle is used in a single reach mode. As the shuttle extends, each movable element remains stationary until the element above it reaches a predetermined point relative thereto. The invention further provides additional latch mechanisms which insure that the load carrying element of the shuttle is the last to retract.
    Type: Grant
    Filed: July 24, 1989
    Date of Patent: January 29, 1991
    Assignee: Eaton Corporation
    Inventor: Paul K. Gines
  • Patent number: 4975586
    Abstract: An end station for an ion implanter which includes a wafer support which is rotatable about a first axis extending substantially along a wafer diameter in the plane defined by the wafer surface, and about a second axis perpendicular to the first axis and extending through the center of the wafer. The drive systems for providing rotation of the wafer support are operable independently of one another and include stepper motors mounted outside the vacuum chamber of the implanter.
    Type: Grant
    Filed: February 28, 1989
    Date of Patent: December 4, 1990
    Assignee: Eaton Corporation
    Inventor: Andrew M. Ray
  • Patent number: 4958440
    Abstract: A device for facilitating the field alignment of the drive and idler wheels of a rail supported S/R machine. Vertical alignment is determined by means of a spirit level at the end of a pivotally mounted bar which is initially set perpendicular to a surface of a base member in magnetic engagement with the side of the wheel, the degree of misalignment being indicated by a dial indicator in contact with the bar. Longitudinal misalignment is determined by a parallelogram assembly one side of which is parallel to the surface of the base member and which includes a pair of spaced apart pins, one stationary and one movable, which engage the rail under the influence of a biasing force applied to the parallelogram assembly. The extent and direction of movement of the movable pin indicates the extent and direction of longitudinal misalignment of the wheel as read by a dial indicator in contact with the movable pin.
    Type: Grant
    Filed: April 17, 1989
    Date of Patent: September 25, 1990
    Assignee: Eaton Corporation
    Inventor: George R. Pipes
  • Patent number: 4952299
    Abstract: A device (24) for handling semiconduct wafers in a vacuum which includes a wafer-receiving arm (80) located in a vacuum chamber and an operating shaft (76) which extends from the vacuum chamber into an atmospheric chamber. The shaft is driven in an axial direction by means of a motor-driven ball screw drive system (74) and angularly by a rotary motor (106) coupled directly to the shaft. The shaft is sealed to maintain vacuum integrity within the vacuum chamber by means of a FERROFLUIDIC rotary seal (110) and by a static seal in the form of a bellows assembly (111) which moves axially with the shaft.
    Type: Grant
    Filed: October 31, 1988
    Date of Patent: August 28, 1990
    Assignee: Eaton Corporation
    Inventors: John M. Chrisos, Bertram F. Fowler, Jr., Richard S. Muka
  • Patent number: 4944860
    Abstract: A platen assembly (66) for holding a semiconductor wafer (30) for vacuum processing. The platen is a substantially solid, circular plate (194) which is surrounded by a movable clamp assembly (192) in the form of a ring having formed thereon a first set of projections (257, 258) for initially receiving a wafer above the plate, and a second set of projections (256) spaced axially from the first set for clamping the wafer to the plate. The ring is formed of two parts (251, 252) spaced apart axially and connected by spring members (254). A slot (255) is formed in the ring to permit the entry of wafers between the sets of projections. The clamp assembly is moved between a wafer receiving position and a clamping position by an annular fluid cylinder (228) and piston (232) assembly. The fluid cylinder and piston assembly includes bellows seals acting between the cylinder and piston rods (238) to maintain the vacuum integrity of the system.
    Type: Grant
    Filed: November 4, 1988
    Date of Patent: July 31, 1990
    Assignee: Eaton Corporation
    Inventors: Robert B. Bramhall, Jr., Richard M. Cloutier
  • Patent number: 4943728
    Abstract: A defining aperture for an ion implanter in which wafers are implanted at high tilt angles, which aperture is configured to project a substantially circular beam pattern on the surface of the tilted wafer. One embodiment includes one or more movable aperture plates having elliptical apertures formed therein operating in conjunction with a fixed aperture plate having a circular aperture. Other embodiments include movable elliptical apertures, and a circular aperture rotatable about an axis perpendicular to the tilt axis of the wafer. Where an electron flood ring is used, one or more movable rings having elliptical apertures opening can be used.
    Type: Grant
    Filed: February 28, 1989
    Date of Patent: July 24, 1990
    Assignee: Eaton Corporation
    Inventors: Jerald P. Dykstra, Andrew M. Ray
  • Patent number: 4929840
    Abstract: A method and apparatus for controlling the ion dose implanted in a semiconductor wafer. The wafer is received on a platen which is rotated in discrete steps by a stepper motor. With the wafer in an initial stationary position the dose accumulated by the wafer is measured. When the incremental measured dose equals the total dose to be implanted divided by a predetermined number of steps over which the implant is to be carried out, the motor is stepped one increment. This process is then repeated until the total desired dose is attained.
    Type: Grant
    Filed: February 28, 1989
    Date of Patent: May 29, 1990
    Assignee: Eaton Corporation
    Inventors: Jerald P. Dykstra, Andrew M. Ray
  • Patent number: 4923584
    Abstract: A sealing arrangement for a vacuum processing system for semiconductor wafers which is effective to apply a sealing force to a valve element (66) between chambers of the processing system. The valve element is defined by a platen which holds wafers (30) for transfer between a horizontal receiving position within a staging chamber (14) to a vertical position within a processing chamber (16-19). The sealing arrangement includes a pair of toggle mechanisms (268) which are manually operable from outside the staging chamber and which, in conjunction with the closing force applied by the platen operating mechanism (165) are effective to maintain vacuum integrity within the staging chamber when the process chamber is at atmospheric pressure or removed for servicing.
    Type: Grant
    Filed: October 31, 1988
    Date of Patent: May 8, 1990
    Assignee: Eaton Corporation
    Inventors: Robert B. Bramhall, Jr., Richard M. Cloutier, Albert P. Laber, Richard S. Muka
  • Patent number: 4891525
    Abstract: An ion source of the side extraction type which includes auxiliary electrodes surrounding the cathode at the ends of the anode, and insulators surrounding the auxiliary electrodes and electrically isolating them from the anode. The auxiliary electrodes essentially define the ends of the discharge chamber, leaving the anode confined to the cylindrical surface surrounding the filament. Each insulator is made up of an inner insulator and an outer insulator with an annular space defined between them. The inner and outer insulators are each in the form of a cylinder with a radially extending flange formed at one end, and interfit with the anode and with each other such that cylindrical spaces are defined between the outer flange portion and the anode and between the inner and outer flange portions. These and other features contribute to improve the electrical isolation between the auxiliary electrode and the anode, prolong source life, and improve beam purity.
    Type: Grant
    Filed: November 14, 1988
    Date of Patent: January 2, 1990
    Assignee: Eaton Corporation
    Inventors: Larry E. Frisa, Monroe L. King, Stephen E. Sampayan
  • Patent number: 4843723
    Abstract: A gauge for determining the proper formation of an annular recess formed at the bottom of a blind bore in the body of a hydraulic lash adjuster. A shaft having a tapered end is mounted in a block and an expandable, cylindrical gauging member is received over the tapered portion. A cylindrical sleeve is received over the shaft and is biased into engagement with the gauging member by springs acting between the block and the sleeve. When this assembly is inserted into the lash adjuster body and the gauging member contacts the bottom of the bore, continued axial movement of the shaft causes the gauging member to expand into the recess as the tapered portion of the shaft moves through the gauging member. Measurement of the amount of movement of the shaft provides an indication of the radial movement of the gauging element by virtue of the tapered interconnection.
    Type: Grant
    Filed: February 16, 1988
    Date of Patent: July 4, 1989
    Assignee: Eaton Corporation
    Inventors: Erwin F. Hentschel, John G. Fahrenbruch, David M. Kennedy
  • Patent number: 4815424
    Abstract: A hydraulic lash adjuster which is mounted in a rocker arm of an internal combustion engine. The plunger of the lash adjuster has a socket formed therein which receives a cylindrical member having a ball end in contact with the socket and a flat surface engageable with a poppet valve of the engine. The ball and socket connection is lubricated by engine oil flowing from the leakdown clearance space between the plunger and the lash adjuster body through a passage which intersects the socket surface. The plunger and the cylindrical member are retained within the body by a single, dish-shaped member which is positioned over the body.
    Type: Grant
    Filed: March 11, 1988
    Date of Patent: March 28, 1989
    Assignee: Eaton Corporation
    Inventors: Bryce A. Buuck, John P. Chapman, David P. Clark
  • Patent number: 4804837
    Abstract: An ion beam neutralizer. High energy electrons are directed through an ion beam neutralizing zone or region containing an ionizable gas. As the high energy electrons collide with the gas molecules, they ionize the gas molecules and produce low energy electrons which are trapped by a positively charged ion beam. As high energy electrons pass out of the neutralizing zone they are deflected back to the neutralizing zone by a cylindrical conductor biased to deflect the high energy electrons and an accelerating grid for accelerating the electrons back through the beam neutralizing zone.
    Type: Grant
    Filed: January 11, 1988
    Date of Patent: February 14, 1989
    Assignee: Eaton Corporation
    Inventor: Marvin Farley
  • Patent number: 4788947
    Abstract: A hydraulic lash adjuster (42) for the valve gear (14) of an internal combustion engine (12) operates from oil received under pressure from a gallery (58) provided in the engine lubricant supply system to compensate for lash in the valve train. The body (60) of the lash adjuster has a moveable plunger assembly (66) provided therein which, prior to installation in the valve gear, is retained in assembly by a retainer (120) formed of an elastic material such as nylon 6/6 including a rim portion (126) embracingly engaging the outer peripheral surface (144) of the body with equally distributed, radially directed clamping forces. The retainer also includes an end wall (122) defining a through bore (124) concentric with a shank portion (80) in the plunger assesmbly. Upon assembly, the retainer is momentarily elastically deformed to enable a bulbous end portion (74) of the plunger assembly to pass therethrough.
    Type: Grant
    Filed: January 2, 1985
    Date of Patent: December 6, 1988
    Assignee: Eaton Corporation
    Inventor: Thomas C. Edelmayer
  • Patent number: 4760262
    Abstract: An ion source (10) of the side-extraction hot cathode type in which the inherent drift of electrons toward the positive side of the cathode is minimized by the addition of auxiliary electrodes (31, 32) which surround the cathode (14) at the ends of the anode (12). The electrodes are electrically isolated from the cathode and anode, and various means are provided to apply a potentials to the electrodes, including interconnecting the electrodes, cross-connecting the electrodes to opposite ends of the cathode, and biasing the electrodes at fixed potentials with respect to the cathode, anode or ground.
    Type: Grant
    Filed: May 12, 1987
    Date of Patent: July 26, 1988
    Assignee: Eaton Corporation
    Inventors: Stephen E. Sampayan, Monroe L. King, Robert A. Moore
  • Patent number: 4733712
    Abstract: A plurality of identical green sand molds are sequentially formed by horizontal compaction on automatic mold making machinery. Each mold has a front and back vertical face with a recess formed in the front face and a plurality of down runners formed in the back face. A mold piece insert is formed of a mixture of green sand and a chemical bonding agent, preferably a resin binder and cold set in a pattern box to form the cavities for the cast articles. The mold piece insert is received flush in the mold front face recess with the cavities opening to the front face. A plurality of molds, with inserts, are adjoined in front-to-back relationship with the down runners overlapping the cavities for feeding the molten pour thereto.
    Type: Grant
    Filed: July 25, 1986
    Date of Patent: March 29, 1988
    Assignee: Eaton Corporation
    Inventor: Roger L. Koppenhofer
  • Patent number: 4724325
    Abstract: An ion beam treatment system for treating silicon wafers placed in the ion beam path. A rotatably mounted wafer pedestal has a plurality of wafer supporting substrates spaced about the pedestal. The substrates are constructed from an elastomer that is chosen for its ability to transfer heat generated by ion collision with the wafers away from the wafers. Each wafer substrate defines a series of elongated depressions across its surface. Certain of these depressions are connected to a pressure source at a wafer loading/unloading station to help acquire the wafers during loading and to facilitate removal of the wafers during unloading. Other depressions vent the interface between the wafers and the substrate to atmosphere to avoid undue pressure build-up on the wafers as they lift off the substrate.
    Type: Grant
    Filed: April 23, 1986
    Date of Patent: February 9, 1988
    Assignee: Eaton Corporation
    Inventors: Allen E. Armstrong, Victor M. Benveniste, David Edwards, Jr.
  • Patent number: 4718379
    Abstract: A retrofit roller bearing pivot assembly for a rocker arm of an internal combustion engine valve gear. A mounting stud or post threaded on one end for attachment to the engine has a fulcrum member received thereover and registered against a head formed thereon with transversely extending oppositely disposed cylindrical bearing surfaces. A roller bearing race is received on each of the bearing surfaces and a semi-cylindrical sleeve member has the post received therethrough and has concave portions on opposite ends thereof journalled on the fulcrum bearing surfacers. The sleeve is retained against the bearings by a spring clip received over the end of the post and engaging ledges on the sleeve. The fulcrum is retained in registration on the post by a contoured supporting spacer held in place by a suitable snap ring received over the post threads. The assembly is sized to drop between the side wall of a cupped rocker arm.
    Type: Grant
    Filed: May 27, 1986
    Date of Patent: January 12, 1988
    Assignee: Eaton Corporation
    Inventor: David P. Clark
  • Patent number: 4715334
    Abstract: A hydraulic lash adjusting tappet (10) for use in engine valve gear of the direct-acting type have one end of the tappet contacting the end (26) of the combustion chamber valve stem (22) and the other end contacting the camshaft lobe (16). The tappet has a body (34) formed with a tubular wall portion (36) having one end thereof closed by an end wall (38) and with a tubular hub (40) therewithin formed integrally with the end wall and extending axially therefrom. A lash adjuster assembly (44) is slidingly received in the tubular hub which defines a reaction surface (50) remote from the cam face reaction surface (18) defined by the end wall.
    Type: Grant
    Filed: May 16, 1986
    Date of Patent: December 29, 1987
    Assignee: Eaton Corporation
    Inventors: Stephen M. Buente, George A. Hillebrand