Abstract: The invention is directed to a method for producing a predetermined resist pattern on a substrate. The method includes the patternwise application of infrared radiation to a precursor which contains the substrate, having a coating thereon, wherein the coating contains a positive working composition; and the development of the pattern using a developer. The composition contains a polymeric substance having functional groups Q thereon, such that the functionalized polymeric substance has the property that it is developer insoluble prior to delivery of infrared radiation and developer soluble thereafter.

Abstract: A head suspension for a rigid disk drive comprising one or more tapered processing holes in the load beam. The tapered processing holes can be located in the rigid region, the flexure or the mounting region. The tapered processing holes have a first diameter at a first surface of the load beam and a second diameter at a second surface of the load beam, wherein the first diameter is less than the second diameter. A method of processing a head suspension for a rigid disk drive is also disclosed. A processing tool is operatively engaging with the tapered processing hole to perform one of mechanically or optically locating, measuring. mounting, and/or aligning a suspension arm or components thereof.