Abstract: Alkynyl pyrrolo[2,3-d]pyrimidines and related analogs are described and demonstrated to have utility as Heat Shock Protein 90 (HSP90) inhibiting agents used in the treatment and prevention of various HSP90 mediated disorders. Methods of synthesis and use of such compounds are also described and claimed.
Type:
Grant
Filed:
March 29, 2006
Date of Patent:
June 9, 2009
Assignee:
Conforma Therapeutics Corporation
Inventors:
Srinivas Rao Kasibhatla, Marco Antonio Biamonte, Jiandong Shi, Marcus F. Boehm
Abstract: The invention relates to a stable polymorphic form of the compound 7-[4-([1,1?-biphenyl]-3-ylmethyl)-1-piperazinyl]-2 (3H)-benzoxazolone monomethanesulfonate (INNM bifeprunox mesylate), a method for the preparation of said polymorphic form and its use in pharmaceutical products, especially in pharmaceutical products for the treatment of psychotic disorders and Parkinson's disease.
Type:
Grant
Filed:
August 18, 2004
Date of Patent:
October 14, 2008
Assignee:
Solvay Pharmaceuticals, Inc.
Inventors:
Irene Eijgendaal, Gerrit Klein, Maria J. L. Terhorst-Van Amstel, Klaas Zwier
Abstract: A bolt-together hitch for a machine having articulatable first and second sections, including a generally annular yoke member of cast steel having a cylindrical portion which is trunnion mounted by bearings in a longitudinal bore formed by the first section and a tube member of forged steel bolted end to end to the yoke member, the yoke member integrally forming brackets to provide an articulated pivot joint with the second section.
Abstract: A method of aligning a lithographic fabrication tool to a substrate to be exposed or patterned by the tool includes the steps of providing a first conductive coil pattern on a surface of the substrate, applying electrical current to the coil pattern, providing a second conductive coil on a surface of the tool, sensing an electro-magnetic field generated by the first coil and the second coil, and aligning the tool according to the signal sensed from the first coil. The method contemplates that electrical current is provided to the first coil from either an external source or the tool. Electrical current is provided by the tool through electrical probes on the tool that contact the first coil, preferably at contact pads. A semiconductor processing lithography apparatus for maskless pattern generation is also disclosed.