Abstract: A polishing pad has a polishing layer and a backing layer secured to the polishing layer. The polishing layer has a polishing surface, a first thickness, a first compressibility, and a hardness between about 40 to 80 Shore D. The backing layer has a second thickness greater than the first thickness and a second compressibility greater than the first compressibility. The first thickness, first compressibility, second thickness and second compressibility are such that the polishing surface deflects at least 2 mil under an applied pressure of 1 psi or less.
Type:
Grant
Filed:
October 1, 2004
Date of Patent:
February 2, 2010
Assignee:
Applied Materials, Inc.
Inventors:
Stan D. Tsai, Shou-Sung Chang, Liang-Yuh Chen