Patents Represented by Attorney Francis L. Masselle
  • Patent number: 4549084
    Abstract: The present invention is directed to an improvement in an alignment system for a scanning mask aligner employing a pattern on the mask or the wafer or both in the scribe lines that run in the direction of scanning, the improvement comprising a viewing system having optical grids, a system for moving the patterns across the optical grids in the viewing system, the grids corresponding to the directions and spacings of the patterns so that light transmitted through the grid is strongly modulated, and circuitry for comparing the phase modulation from the mask and wafer alignment targets to obtain alignment error signals; further according to the invention, the same system used to measure alignment can also be used to measure how well the mask is focused on the wafer.
    Type: Grant
    Filed: December 21, 1982
    Date of Patent: October 22, 1985
    Assignee: The Perkin-Elmer Corporation
    Inventor: David A. Markle
  • Patent number: 4547446
    Abstract: The present invention is directed to motion measurement and alignment method and apparatus for use, interalia, in association with optical lithographic systems and more particularly in one form thereof to a method of making a wafer-tool for testing the mask-wafer stage motion and the mask-wafer stage alignment comprising the steps of: inserting a master mask, having an alignment pattern and a motion measurement pattern thereon, into a projection mask aligner, inserting a photoresist-coated semiconductor wafer into said projection mask aligner, aligning the mask and wafer with respect to each other using the alignment pattern, exposing the photoresist on the wafer, chemically etching the wafer to perfect the motion measurement pattern thereon, thereby forming a wafer-tool having an image of the motion measurement pattern.
    Type: Grant
    Filed: June 20, 1983
    Date of Patent: October 15, 1985
    Assignee: The Perkin-Elmer Corporation
    Inventor: Wai-Ming Tam
  • Patent number: 4545683
    Abstract: Zone plate alignment aids on a mask and semiconductor wafer are used in a projection type system for aligning the wafer and mask prior to transfer of a circuit pattern from the mask to the wafer in an exposure process. The condenser system includes an aperture in the shape of a chevron or other convenient alignment pattern while the viewing system of the device is provided with a complementary shaped pupil stop. The condenser aperture and the viewing system stop cofunction to enhance the image contrast seen through the viewing system.
    Type: Grant
    Filed: February 28, 1983
    Date of Patent: October 8, 1985
    Assignee: The Perkin-Elmer Corporation
    Inventor: David A. Markle
  • Patent number: 4539695
    Abstract: The present invention is directed to X-ray lithographic systems, which are characterized by a plurality of work stations, a cartridge in which a wafer and mask are mounted, apparatus for moving the cartridge between the stations, apparatus for moving the cartridge within each station to a kinematic mount, and said kinematic mounts in all of the stations being substantially identical.
    Type: Grant
    Filed: January 6, 1984
    Date of Patent: September 3, 1985
    Assignee: The Perkin-Elmer Corporation
    Inventor: Carlo La Fiandra
  • Patent number: 4536089
    Abstract: Apparatus for detecting the existance of a source of coherent radiation in the presence of incoherent radiation. A beam splitter splits the radiation into two paths. Means are included in one path for transmitting the incoherent radiation and modulated coherent radiation. The other path effectively transmits only the incoherent radiation. Balancing means are used to balance out the incoherent radiation transmitting only the modulated coherent radiation which is then detected.
    Type: Grant
    Filed: January 31, 1979
    Date of Patent: August 20, 1985
    Assignee: The Perkin-Elmer Corporation
    Inventor: Edward T. Siebert
  • Patent number: 4536086
    Abstract: Methods and means are provided for making measurements of the optical figure of a remote thin deformable mirror (16). Relatively small holographic elements (24) are formed on portions of the mirror (16). A laser beam is transmitted to illuminate the elements (22). Diffracted laser beam signals from the elements (22) are used to produce a hologram or corrector plate (34) which is subsequently used to produce reference signals representative of the original shape of the mirror. When the holographic elements (22) of the mirror are subsequently illuminated by a laser beam, the diffracted signals reconstruct the reference signals recorded or stored on the corrector plate (34). The output signal represents the deviations of the mirror from its original shape.
    Type: Grant
    Filed: November 18, 1982
    Date of Patent: August 20, 1985
    Assignee: The Perkin-Elmer Corporation
    Inventor: David M. Shemwell
  • Patent number: 4533449
    Abstract: An apparatus and method for reshaping an optical surface by the controlled deposition of material thereon. A deposition source is disposed adjacent the optical surface to be reshaped and moved relative to the surface under control of a computer depositing material onto the surface for reforming it into a predetermined shape.
    Type: Grant
    Filed: April 16, 1984
    Date of Patent: August 6, 1985
    Assignee: The Perkin-Elmer Corporation
    Inventor: Harold Levenstein
  • Patent number: 4534047
    Abstract: This invention is directed to a mask ring assembly for X-ray lithography which is particularly adapted, among other possible uses, for use in replicating integrated circuit patterns, said assembly including a mask ring, a plurality of kinematic mounts for removably mounting the mask ring on an alignment cartridge, each of the kinematic mounts including a funnel-like shaped seat member and a mating ball-like shaped member, one of said members being on the mask ring and the other of the members being mounted on the alignment cartridge.
    Type: Grant
    Filed: January 6, 1984
    Date of Patent: August 6, 1985
    Assignee: The Perkin-Elmer Corporation
    Inventors: Warren Deschenaux, Gregory Hughes, Justin Kreuzer, Carlo La Fiandra
  • Patent number: 4530635
    Abstract: A wafer chuck assembly having an elevator for accepting a wafer and placing it precisely on a platen without changing its spatial orientation.
    Type: Grant
    Filed: June 15, 1983
    Date of Patent: July 23, 1985
    Assignee: The Perkin-Elmer Corporation
    Inventors: Orest Engelbrecht, Joseph L. Laganza
  • Patent number: 4530565
    Abstract: A transformer assembly particularly adapted, among other possible uses, for use in ring field illumination systems such as, for example, systems used in microlithography, said optical transformer assembly including an elongated member of glass or fused silica having a nearly circular or rectangular shape at one end for receiving a non-uniform input beam of light and through a gradual transitional intermediate section to an arcuate shape at the other end for outputting a uniformly illuminated arcuate shaped beam of light.
    Type: Grant
    Filed: December 20, 1982
    Date of Patent: July 23, 1985
    Assignee: The Perkin-Elmer Corporation
    Inventor: David A. Markle
  • Patent number: 4506204
    Abstract: This invention is directed to electro-magnetic alignment apparatus, which is particularly adapted, among many other possible uses, for use in aligning the wafers in a microlithography system, said apparatus including in combination at least three magnet assemblies which are mounted in space relationship one with respect to the others, at least three coil assemblies mounted to pass through the high flux region of the magnet assemblies respectively, the width of the coil assemblies being substantially less than the width of the high flux regions respectively, a controller for controlling the flow of current through the coil assemblies respectively, a structural assembly for connecting the coil assemblies which is movable with respect to the magnet assemblies, the coil assemblies being wound with respect to each other so that by controlling the supply of current to the coils the structure assembly can be moved selectively in three degrees of freedom.
    Type: Grant
    Filed: June 10, 1983
    Date of Patent: March 19, 1985
    Assignee: The Perkin-Elmer Corporation
    Inventor: Daniel Galburt
  • Patent number: 4506205
    Abstract: This invention is directed to electromagnetic alignment apparatus, which is particularly adapted, among many other possible uses, for use in aligning the wafers in a microlithography system, said apparatus comprising in combination three or more spaced magnets, three or more coil assemblies mounted to pass through the magnetic fields of the magnets respectively, means for controlling the flow of current through the coil assemblies respectively, said coil assemblies being joined together to form a structure movable with respect to the magnets and adapted to carry an object thereon, the coil assemblies being wound with respect to each other so that by controlling the supply of current to the coils the structure can be moved selectively in three degrees of freedom.
    Type: Grant
    Filed: June 10, 1983
    Date of Patent: March 19, 1985
    Assignee: The Perkin-Elmer Corporation
    Inventors: David Trost, Daniel Galburt
  • Patent number: 4504144
    Abstract: An apparatus automatically for correcting tilt and focus errors of a wafer in a mask projection system for a plurality of subfields on the wafer which vary in position according to a known scheme. The tilt and focus of each subfield on the wafer is individually corrected by three axial actuators operating on the variable X and Y coordinates of the center of each subfield and its tilt and focus errors.
    Type: Grant
    Filed: July 6, 1982
    Date of Patent: March 12, 1985
    Assignee: The Perkin-Elmer Corporation
    Inventor: David Trost
  • Patent number: 4494212
    Abstract: A variable gain amplifier with digital output is described. The amplifier is useful for but not limited to input range selection in chart recorders or other measuring instruments. To minimize the number of expensive presision resistors used in the gain selection network each selected range is approximated by switching. A software routine then adjusts the gain after digitizing to the correct value for the selected range. Both range switching and gain correction are controlled by a general purpose microprocessor which also is available for other duties in the instrument.
    Type: Grant
    Filed: July 6, 1984
    Date of Patent: January 15, 1985
    Assignee: The Perkin-Elmer Corporation
    Inventor: William C. Muellner
  • Patent number: 4492669
    Abstract: A uniform reticulated intrastructure (56) is placed in a container (58) and surrounded by beryllium powder (72). After closing the container (58) and applying heat and pressure, a hardened form is taken out of the container. The intrastructure (56) is then removed leaving a lightweight solid beryllium body (72) suitable for use as a mirror (52). Means (62, 66) are provided to control the spacing of the intrastructure elements during the forming process.
    Type: Grant
    Filed: March 21, 1983
    Date of Patent: January 8, 1985
    Assignee: The Perkin-Elmer Corporation
    Inventor: Gerald Gould
  • Patent number: 4493097
    Abstract: This invention relates to an electron gun assembly for use, for example, in x-ray lithography, which includes an electron emitter assembly, beam forming elements disposed adjacent the electron emitter assembly, a target plane disposed in spaced relationship with respect to the electron emitter assembly, a deflector disposed adjacent the path of the electrons emitted from the electron emitter assembly, a pseudoanode mounted in spaced relationship with respect to the deflector and to the electron emitter assembly and to the target plane, said electron emitter assembly being interposed between the pseudoanode and the target plane.
    Type: Grant
    Filed: August 30, 1982
    Date of Patent: January 8, 1985
    Assignee: The Perkin-Elmer Corporation
    Inventor: Robert H. Clayton
  • Patent number: 4482971
    Abstract: An apparatus for detection of flaws in currency having multiple misregistered images. Optical means scan a test note to provide a plurality of outputs each representative of a particular patch value of a particular scan line of the test note. Generating means provide a plurality of outputs each representative of a particular patch value of a particular scan line of a reference note which is generated in real time as the test note is scanned. The generating means includes means to insure that each generated reference patch value is provided for comparison with the corresponding patch value of the test note. Each reference patch value is generated for any value of misregistration between the multiple images within a predetermined tolerance.
    Type: Grant
    Filed: January 18, 1982
    Date of Patent: November 13, 1984
    Assignee: The Perkin-Elmer Corporation
    Inventor: Henry Blazek
  • Patent number: 4479927
    Abstract: Aluminum chloride gases and other gases from a processing system are directed to a cold trap including a blower connected thereto. The blower directs the gases, except for the aluminum chloride, out of the cold trap. The aluminum chloride is solidified in the trap. Means including a heater are provided to convert the solid aluminum chloride to a vapor and selectively empty the aluminum chloride out of the cold trap into another trap associated with means for chemically treating the aluminum chloride. The cold trap is then cooled and ready to receive additional aluminum chloride from the processing system.
    Type: Grant
    Filed: August 9, 1982
    Date of Patent: October 30, 1984
    Assignee: The Perkin-Elmer Corporation
    Inventor: Barry Gelernt
  • Patent number: 4459021
    Abstract: A registration system for use with a document inspection system wherein a test document is compared with a master document stored in a computer memory in which the registration system has means for aligning each point on the test document with its corresponding point of the stored master document. The document inspection system optically scans each point on the test document and provides real time input to a flaw detector. The registration system optically scans the leading corners of the test document and generates addresses to read out from memory each point on the master document in precise registration with its corresponding point on the test document corrected for misalignment of the test document relative to the stored master document.
    Type: Grant
    Filed: November 3, 1978
    Date of Patent: July 10, 1984
    Assignee: The Perkin-Elmer Corporation
    Inventor: Henry Blazek
  • Patent number: 4450574
    Abstract: A circuit for controlling the proportions of a plurality of solvents being introduced into a column of a liquid chromatograph. The circuit compensates for the compressibility of liquids by dividing the time during each pumping cycle during which the pump is delivering liquid to the column into a known number of intervals. A circuit responsive to the interval signals opens and closes solvent valves thereby allowing the solvents to be introduced into the pump in the desired proportions.
    Type: Grant
    Filed: January 29, 1982
    Date of Patent: May 22, 1984
    Assignee: The Perkin-Elmer Corporation
    Inventor: Arnold Schwartz