Abstract: A system of the present invention stores: a first index which designates lists of keywords contained in texts from identifications of the respective texts; a second index which designates lists of texts containing keywords from identifications of the respective keywords; and the number of texts containing the respective keywords. Then, upon receiving an input of a text search condition, the system calculates an estimation of search time by the first index and an estimation of search time by the second index, and determines which one of the first and second indexes makes a search faster. Then, by using the index which has been determined to make the search faster, the system searches for keywords which appear in texts satisfying the text search condition with higher frequency.

Abstract: A method of creating metal caps on copper lines within an inter-line dielectric (ILD) deposits a thin (e.g., 5 nm) metal blanket film (e.g., Ta/TaN) on top the copper lines and dielectric, after the wafer has been planarized. Further a thin dielectric cap is formed over the metal blanket film. A photoresist coating is deposited over the thin dielectric cap and a lithographic exposure process is performed, but without a lithographic mask. A mask is not needed in this situation, because due to the reflectivity difference between copper and the ILD lying under the two thin layers, a mask pattern is automatically formed for etching away the Ta/TaN metal cap between copper lines. Thus, this mask pattern is self-aligned above the copper lines.

Abstract: A method for collecting, aggregating, and composing metrics and a computer system comprises a producer application adapted to periodically generate metrics comprising state information of the producer application; a metric engine adapted to aggregate the metrics; and a consumer application adapted to receive the aggregated metrics, wherein the metric engine is further adapted to produce new metrics in accordance with desired requirements of the consumer application. The computer system further comprises a metric service policy adapted to provide definitions of the metrics generated from the producer application and desired requirements of the consumer application, wherein the metric service policy is adapted to establish an executable set of actions for producing the new metrics from the generated metrics, wherein the metric service policy is adapted to be executable by the metric engine, and wherein multiple metric service policies are simultaneously executable by the metric engine.

Abstract: In response to determining that computer generation of an abstract workflow plan for a network-accessible service resulted in failure, a method attempts to automatically recover from the failure. Where attempting to automatically recover from this failure is unsuccessful, the method applies remedy rules, to assist in debugging the failure. In response to determining that computer assignment of a physical plan for the abstract workflow plan resulted in failure, the method attempts to automatically recover from the failure. Where attempting to automatically recover from this failure is unsuccessful, the method applies remedy rules, to assist in debugging the failure. In response to determining that computer evaluation of a runtime configuration for the physical plan resulted in a failure, the method attempts to automatically recover from the failure. Where attempting to automatically recover from this failure is unsuccessful, the method applies remedy rules, to assist in debugging the failure.

Abstract: A method of estimating integrated circuit yield comprises providing an integrated circuit layout and a set of systematic defects based on a manufacturing process. Next, the method represents a systematic defect by modifying structures in the integrated circuit layout to create modified structures. More specifically, for short-circuit-causing defects, the method pre-expands the structures when the structures comprise a higher systematic defect sensitivity level, and pre-shrinks the structures when the structures comprise a lower systematic defect sensitivity level. Following this, a critical area analysis is performed on the integrated circuit layout using the modified structures, wherein dot-throwing, geometric expansion, or Voronoi diagrams are used. The method then computes a fault density value, random defects and systematic defects are computed.

Abstract: Embodiments herein include a transfer assist blade that is adapted to bias media toward a marking device. The transfer assist blade has a plurality of movable blade segments that overlap one another. In one embodiment, a first movable blade segment (comprising a first wear layer and a first underlying layer beneath the first wear layer) overlies a second movable blade segment (comprising a second wear layer and a second underlying layer beneath the first wear layer). More specifically, in this embodiment, a portion of the first wear layer overlaps a portion of the second wear layer.