Abstract: A method of forming a self-aligned vertical double-gate metal oxide semiconductor field effect transistor (MOSFET) device is provided that includes processing steps that are CMOS compatible.
Type:
Grant
Filed:
November 9, 2000
Date of Patent:
April 16, 2002
Assignee:
International Business Machines Corporation
Inventors:
Scott Crowder, Michael J. Hargrove, Suk Hoon Ku, L. Ronald Logan