Abstract: The cryopanel of a cryopump can be preferentially defrosted to remove an acid-forming or toxic gas while leaving a second gas substantially condensed upon the cryopanel thereby limiting interaction between the vapor phases of the two gases. The cryopanel is warmed to a temperature within a selective defrost range at which the first gas selectively sublimates from the cryopanel. The temperature of the cryopanel is then maintained at a temperature within this range until the cryopanel is substantially cleared of the first gas leaving the second gas substantially undisturbed as a condensate upon the cryopanel. In a preferred embodiment, the cryopanel is maintained at about 50 to 85K during standard operation before being defrosted.
Type:
Grant
Filed:
November 25, 1997
Date of Patent:
October 13, 1998
Assignee:
Helix Technology Corporation
Inventors:
Michael J. Eacobacci, Jr., Stephen R. Matte