Abstract: Homogeneous thermoset terpolymers which may be used in the preparation of laminates for circuitry boards will comprise a diepoxide of a polyether of a polyphenol, a dicyanate ester of a polyether of a polyphenol and an alkenyl aryl compound. The polymers are prepared by admixing a solution of the diepoxide of a polyether of a polyphenol and an alkenyl aryl compound with a second solution of the dicyanate ester of a polyether of a polyphenol and the alkenyl aryl compound at elevated temperatures. The resulting terpolymer will possess desirable characteristics such as high glass transition temperature and low dielectric constant.

Abstract: Sulfuric acid contaminated with boron and fluoride values such as the waste acid of a boron trifluoride process is purified by contacting the contaminated acid with an inert gas to desorb boron trifluoride, and the inert gas is stripped by contacting with an absorbing liquid including concentrated sulfuric acid. Hydrogen fluoride and/or fluorosulfuric acid are added to contaminated sulfuric acid as agents to spring non-volatile boron value. In addition, the water content of the contaminated acid is adjusted within a narrow concentration range, to improve the efficiency of both the stripping and the absorption operations. The absorption of boron trifluoride into the absorbing sulfuric acid is improved when it contains boric acid. Preferably the contaminated sulfuric acid to be purified is one portion of the waste liquid and the absorbing liquid is another portion of the waste liquid of a boron trifluoride manufacturing process.

Abstract: High temperature thermosetting resin compositions which may be used as a polymer matrix for a printed circuit board will comprise a terpolymer of an ethylenically monosubstituted unsaturated monomer in which said substituent is an aromatic moiety such as styrene, an ethylenically alpha,beta-disubstituted unsaturated monomer in which each substituent is an aromatic or benzylic moiety such as acenaphthylene and a glycidyl ester of a monoethylenically unsaturated acid such as glycidyl methacrylate cross-linked with a copolymer of an anhydride of a dibasic olefinic acid such as maleic anhydride and an ethylenically monosubstituted unsaturated monomer in which said substituent is an aromatic moiety such as styrene.

Abstract: Homogeneous thermoset terpolymers which may be used in the preparation of laminates for circuitry boards will comprise a poly(vinyl benzyl ether) of a polyphenol, a dicyanate ester of a polyether of a polyphenol and an alkenyl aryl compound. The polymers are prepared by admixing a solution of the poly(vinyl benzyl ether) of a polyphenol and an alkenyl aryl compound with a second solution of the dicyanate ester of a polyether of a polyphenol and the alkenyl aryl compound at elevated temperatures. The resulting terpolymer will possess desirable characteristics such as high glass transition temperature and low dielectric constant.

Abstract: Poly(esteramide) having thermotropic polymorphic properties is characterized by the repeating structure ##STR1## where: x=integers from 1 to 14Y=integers from 3 to 9R.sub.1, R.sub.2 =Hwhen x+y is an odd integer, properties usually associated with liquid crystal polymers are seen, while when x+y is an even integer birefringence above a major endotherm is observed but the spontaneous flow property usually seen with liquid crystal polymers is absent.

Abstract: Isobutane is dehydrogenated to isobutylene with minimal, preferably no more than 15%, loss of the fresh feed isobutane by structural isomerization or cracking, even when the dehydrogenation feed contains substantial amounts of isobutylene. The catalysts employed comprise platinum and promoting amounts of at least one of indium, neodymium, and tin on a nonacidic support, such as zinc aluminate. The reaction is carried out at a pressure of 0.14 to 2 bar, and an outlet temperature, .sup.o K, minimum residence time, sec., defined by the equationR=1.76.times.10.sup.-4 e.sup.7890/T.

Abstract: Compression refrigeration equipment using tetrafluoroethane as a working fluid employs polyoxyalkylene glycols which are at least difunctional with respect to hydroxyl groups and a molecular weight between 300 and 2000. The mixtures of the glycols with the refrigerant will be miscible in the range from -40.degree. C. to at least + 20.degree. C.

Abstract: Temporary corrosion protection for fresh metal surfaces may be obtained by depositing a thin film of a protective organic compound, particularly a fatty acid ester, from a solvent, preferably a fluorocarbon on the surface to be protected. The film-forming esters are chosen to be self-removing by evaporation so that no cleaning is needed before carrying out processes which require a clean metal surface.

Abstract: Disclosed are substituted derivatives of 5-diazobarbituric acid selected from those having the formulas: ##STR1## wherein R.sub.1 and R.sub.2 are substituents selected from the group consisting of C.sub.3 to C.sub.12 alkyl, cyclohexyl, benzyl and C.sub.2 to C.sub.6 aralkyl groups, wherein R.sub.3 and R.sub.4 are substituents selected from the group consisting of C.sub.1 to C.sub.12 alkyl, cyclohexyl, benzyl or other C.sub.2 to C.sub.6 aralkyl groups and R.sub.5 is selected from the group consisting of .alpha.,.omega.-disubstituted C.sub.2 to C.sub.12 alkyl, methylene dicyclohexyl, or C.sub.1 to C.sub.6 dialkylphenylene.These compounds provide DUV response with an absorption maximum near 260 nm. The substituents are chosen to be nonabsorbing alkyl groups that allow efficient photobleaching of the sensitizer during exposure.The sensitizers of the present invention are designed to function in the DUV region and are useful in the manufacture of semi-conductor devices.

Abstract: Thermoset polymers of styrene terminated tetrakis phenols may be prepared from resins which possess the generic formula ##STR1## in which R is selected from the group consisting of alkyl, cycloalkyl, alkaryl and substituted alkaryl radicals and X is independently selected from the group consisting of hydrogen and halogen atoms. These polymers will be utilized as a component in laminates on circuit boards which are employed in relatively complicated pieces of electronic equipment.

Abstract: A novel positive photoresist formulation is provided based on a 1:1 copolymer of maleimide and an aliphatic vinyl ether or ester in combination with a photoactive sensitizer capable of undergoing a change in aqueous alkaline solubility upon exposure to actinic radiation. The copolymers disclosed have structures of the following type: ##STR1## where R is an alkyl substituent of from 1 to 20 carbon atoms, benzyl, C.sub.1 to C.sub.10 aralkyl, C.sub.3 to C.sub.12 cycloalkyl or ##STR2## where R" has the structures assigned to R, and where R' is independently H, C.sub.1 to C.sub.10 alkyl, phenyl, benzyl or C.sub.1 to C.sub.10 aralkyl. The polymers are compounded with a photoactive sensitizer capable of undergoing a change in aqueous alkaline solubility upon exposure to actinic radiation such as with diazonaphthoquinone sulfonic acid esters and amides. The polymer and sensitizer compositions are dissolved together in a solvent useful for spin casting of thin films on substrates.

Abstract: An improved method is presented for the deposition of dielectric films in the fabrication of integrated circuits (ICs), wherein a solution of polymers derived from cyclosilazanes is employed to deposit dielectric films on semiconductor substrates by the spin-on technique. These spin-on films planarize (smooth out) underlying substrate topography and therefore are especially advantageous in multilevel metallization processes where they allow a highly uniform and continuous deposition of a subsequent layer of metallization resulting in improved yield and reliability of ICs.

Abstract: Carbon fluoride and metal are co-deposited from an electroless plating bath onto a suitable solid, forming a thin surface layer having low surface energy and good lubricity. Carbon fluoride particles having an average size from 0.2 to 8 .mu.m are dispersed in an aqueous solution using 0.5 to 2 volume percent of surfactants comprising a nonionic surfactant having an HLB number of 10 to 20, optionally including up to a maximum 20% of a cationic surfactant based on the amount of nonionic surfactant used. Sufficient presuspended carbon fluoride particles are combined with an electroless metal plating bath to provide 1-50 grams of carbon fluoride per liter of the bath.

Abstract: A carboxylic acid anhydride such as acetic anhydride, is prepared from a carboxylate ester or a hydrocarbyl ether in processes comprising the use of a halide, carbon monoxide and a Group VIII noble metal.

Abstract: An improved process for preparing formaldoxime trimer is provided in which loss of the product is minimized and the prior art problems of long retention times to afford precipitation of the trimer which is difficult to filter and which occludes the undesirable salt of the acid that is difficult to remove. The method disclosed involved oximation of paraformaldehyde using dehydroxylamine sulfate and ammonia gas followed by steam stripping to recover formaldoxime and separate trimerization thereof followed by filtration recovery and drying.The formaldoxime trimer is produced in essentially quantitative yield and proceeds specifically by a procedure of steam stripping out the formaldoxime monomer from the synthesis liquor and allowing separate trimer formation and recovery. The product is free from inorganic salts and the mother liquor with formaldoxime monomer content, resulting from its recovery by filtration, does not represent a yield loss in that it is recyclable to the next synthesis reaction.

Abstract: An improved process for reducing ammonium ion concentration in an ammonium ion-containing, acidic liquor is provided. The process includes the essential step of reacting ammonium ion with a persulfate.

Abstract: In the manufacture of semiconductor components, direct etching is effected using electrons. In a specific application an electron beam may be used to directly etch a pattern in a dielectric layer in an atmosphere of low pressure sulfur hexafluoride. The technique involves a simpler alternative to the more typical microcircuit manufacturing processes in which dielectric layers such as silicon dioxide, silicon nitride or silicon oxynitride are etched by either plasma or wet chemical techniques through a photoresist mask. The latter invariably involves a large number of process steps. The disclosed method presents a simpler alternative in which the silicon dioxide, for example, is patterned directly and which may be particularly suited to very small (sub-micron) geometries or to more conventional geometries if a high intensity electron flood exposure system is used.

Abstract: Anthraquinone is produced by reacting phthalic anhydride with benzene in the liquid phase over a super acid catalyst which may be an oxide of the Group 4b metals zirconium, hafnium, and titanium, or the Group 5b metals niobium, tantalum, and vanadium, preferably zirconium oxide, such oxides being treated with sulfuric acid and calcined. The process may also be applied to substituted equivalents, such as methyl phthalic anhydride and toluene.

Abstract: Polymers of fluorene containing compounds which form crosslinked networks are found to provide useful negative photoresists which are sensitive in the ultraviolet wavelength range of between about 200 nm to 300 nm. When used in negative photoresist compositions, these fluorene compounds produce a high resolution and thus higher information density in microcircuits manufactured using these photoresists.

Abstract: A silver salt solution suitable for depositing silver on a support in the preparation of silver catalysts is made by reacting a silver compound with a neo-acid, in a hydrocarbon solvent. The reaction is completed under reflux conditions, thereby removing water formed by the reaction and reacting at least 90% of the unreacted acid. Therefore, the solution may be used without further processing to impregnate a porous support, thereby providing a catalyst useful for oxidation of ethylene oxide.