Abstract: An optical recording medium has deposited on a substrate a recording layer incorporating therein a cyanine dye, preferably an indoline dye, and optionally incorporating therein an autoxidizable compound or a thermoplastic resin and/or a singlet oxygen quencher.

Abstract: An optical recording medium has deposited on a substrate a recording layer incorporating therein a cyanine dye, preferably an indoline dye, and optionally incorporating therein an autoxidizable compound or a thermoplastic resin and/or a singlet oxygen quencher.

Abstract: An optical recording medium has deposited on a substrate a recording layer incorporating therein a cyanine dye, preferably an indoline dye, and optionally incorporating therein an autoxidizable compound or a thermoplastic resin and/or a singlet oxygen quencher.

Abstract: A photostable cyanine dye possessing a structure represented by the general formula I or II:.PHI..sup.+ -L=.PSI..multidot.Q.sup.- (I).PHI.=L-.PSI..sup.+ .multidot.Q.sup.- (II)wherein .PHI. denotes a monovalent or divalent residue of thiazole ring, oxazole ring, selenazole ring, imidazole ring, pyridine ring, indolenine ring, benzoindolenine ring or dibenzoindolenine ring which may have an aromatic ring condensed thereto, .PSI. denotes a divalent or monovalent residue of thiazole ring, oxazole ring, selenazole ring, imidazole ring, pyridine ring, indolenine ring, benzoindolenine ring or dibenzoindolenine ring which may have an aromatic ring condensed thereto, L denotes a polymethine connecting group for the formation of a cyanine dye, and Q.sup.- denotes an anion represented by the general formula III: ##STR1## wherein M denotes a transition metal atom, R.sup.1, R.sup.2, R.sup.3 and R.sup.

Abstract: The present invention provides a process for producing oxazopyrroloquinolines which comprises culturing microorganisms to produce pyrroloquinolinequinone and adding .alpha.-amino acids or monomethylamine to the resulting culture broth which contains the pyrroloquinolinequinone and from which cells of microorganisms are not separated, thereby to convert the pyrroloquinolinequinone to the corresponding oxazopyrroloquinolines. The thus obtained oxazopyrroloquinolines include novel compounds. The present invention further provides aldose reductase inhibitors, diabetic combined disease curing agents, immunopotentiating agents and liver disease inhibiting agents which contain as active ingredient these oxazopyrroloquinolines having excellent physiological activity.

Abstract: An antagonism caused by the use of a herbicide for narrowleaf weeds together with a herbicide for broadleaf weeds is inhibited by using together with hydrophilic polymeric compound containing a quaternary ammonium salt and having 10,000 to 1,000,000 of molcular weight.

Abstract: Proposed is a box container suitable for holding and transporting a plural number of sheet-like bodies such as lead frames for semiconductor devices such as ICs. The box container consists of three parts including (a) an inner box member to hold the sheet bodies, (b) a box tray member into which the inner box member is inserted and (c) a covering member to be engaged with the box tray member.

Abstract: Proposed is an alkali-soluble, positive-working photosensitive resin composition which can be used as a material for forming a finely patterned resist layer on the surface of a metallic substrate such as tantalum to exhibit excellent adhesion of the patterned resist layer to the substrate surface. The composition comprises, in addition to a novolac resin as a film-forming agent and a naphthoquinone diazide group-containing compound as a photosensitizer, an aromatic compound having two benzene rings and at least five phenolic hydroxy groups in a molecule such as pentahydroxy and hexahydroxy benzophenone compounds as an adhesion improver.

Abstract: Proposed is a positive-working photosensitive resin composition suitable as a photoresist in the photolithographic patterning work for the manufacture of, for example, semiconductor devices having excellent storage stability and capable of giving a patterned resist layer having excellent contrast of the images, orthogonality of the cross sectional profile of line patterns and heat resistance along with a satisfactorily high photosensitivity and large focusing latitude. The composition comprises, in admixture with an alkali-soluble novolac resin as a film-forming agent, a photosensitizing agent which is an esterification product of a specific tris(hydroxyphenyl) methane compound of which two of the hydroxyphenyl groups each have a cyclohexyl group bonded thereto at a specified position with at least one naphthoquinone-1,2-diazide sulfonyl group as the esterifying group.

Abstract: A novel alkali-developable photosensitive resin composition, which is suitable for use as a photoresist composition for fine patterning in the manufacture of various electronic devices, is proposed. The photosensitive resin composition comprises, as the essential ingredients, (a) an alkali-soluble novolac resin as the film-forming ingredient and (b) a very specific compound which is a 1,2-quinone diazide sulfonic acid ester of a condensation product having a weight-average molecular weight of 400 to 2000 obtained by the condensation reaction between phenol and a hydroxybenzaldehyde in the presence of an acidic catalyst as the photosensitizing agent. By virtue of the formulation with this specific photosensitizer, the resist layer formed from the inventive composition has a greatly increased focusing latitude in addition to the excellent sensitivity, resolution and heat resistance.

Abstract: A method for the solid-phase synthesis of peptides or proteins in high yield and high purity uses a solid support consisting of a functionalized polystyrene-grafted polymer substrate, the grafted polystyrene chains being substantially non-cross-linked and having a chain molecular weight, not including optional non-reactive substituents, of at least 200,000, preferably in the range of 600,000-1,200,000. Particularly suitable polymer substrates are substrates of a polyolefin such as polyethylene. The method is particularly well-suited to the compartmentalized synthesis of a multitude of peptides or proteins in a parallel and substantially simultaneous fashion.

Abstract: Pyrrolo quinoline esters, oxazopyrrolo quinolines and esters of oxazopyrrolo quinolines are effective at treating cataracts through their active oxygen scavenging activity.

Abstract: Disclosed is a novel negative-working radiation-sensitive resist composition useful in the photolithographic patterning works of resist layers on substrate surfaces in the manufacture of semiconductor devices and capable of giving a finely patterned resist layer with high resolution and having an excellently orthogonal cross sectional profile of the line-wise patterned resist layer with an outstandingly high sensitivity to various actinic rays. The composition comprises, as the essential ingredients, (a) an alkali-soluble resin such as a cresol novolac resin, (b) a specific alkoxymethylated amino resin, e.g., methoxymethylated melamine resin, and (c) a specific triazine compound in a limited weight proportion.

Abstract: A novel and very effective method is proposed for the stabilization of a higher aliphatic compound having at least one double bond in a molecule such as the sex pheromone compounds of agricultural pest insects used for the elimination of the pest insect by the method of mating disruption. The method comprises admixing the sex pheromone compound with each a specified amount of (a) a specific phenolic compound, e.g., tert-butyl hydroquinone, di-tert-butyl hydroquinone, di-tert-amyl hydroquinone, di-tert-butyl p-cresol, methyl hydroquinone and p-methoxy phenol, as an antioxidant and (b) 2-(2'-hydroxy-3'-tert-butyl-5'-methyl phenyl)-5-chloro benzotriazole in combination.

Abstract: In a process for producing trialkoxysilanes by reaction of a metallic silicon and an alcohol having 1 to 4 carbon atoms, the reaction is effected (1) using as the metallic silicon one containing 0.30 to 0.37% by weight of aluminum, (2) using as the catalyst cuprous chloride prepared by a wet process, and (3) allowing aluminum and/or an aluminum compound to coexist, thereby securing a high conversion rate of metallic silicon, and accordingly decreasing the amount of unreacted metallic silicon and suppressing discharge of industrial wastes with eliminating environmental problems.

Abstract: A novel organopolysiloxane compound having, in a molecule, at least one silyl-substituted ethyl group of the general formula ##STR1## in which R.sup.1 is a hydrogen atom or a methyl group, R is a monovalent hydrocarbon group and the subscripts a is 2 or and b is 1, 2 or 3, or a linear organopolysiloxane having, at each molecular chain end, at least one of such a group, can be prepared by first reacting a vinyl-containing organopolysiloxane with a hydrogen chlorosilane compound to effect the hydrosilation reaction between the silicon-bonded vinyl groups and the silicon-bonded hydrogen atoms and then the silicon-bonded chlorine atoms are subjected to a dehydrochlorination reaction with a silanol compound of the general formula ##STR2## A composition comprising the organopolysiloxane and a photopolymerization initiator is highly sensitive to light and readily cured into a rubbery elastomer by irradiation with ultraviolet light.

Abstract: Pyrrolo-quinoline quinone (PQQ) is microbiologically produced by culturing a bacterium in a medium containing methanol, methylamine or a mixture thereof as a carbon source and recovering PQQ from the culture medium. The bacteria are strains of Methylobacterium, Ancylobacter, Hyphomicrobium, Xanthobacter, Thiobacillus, Microcyclus and Achromobacter.

Abstract: A motor lorry spring hanger assembly (10) including a pair of generally parallel, co-extensive vertically oriented cheek plates (11). The cheek plates (11) have upper flanges (12, 13) through which bolts pass to secure the assembly to the main frame of the motor lorry. The cheek plates (11) are maintained in a generally parallel spaced relationship by means of a spacer box (16). The lower portions of the cheek plates (11) are provided with apertures (22) through which a spring bolt (21) passes. There is also provided bushing (23) engaging the cheek plates (11) and through which the bolt (21) passes.

Abstract: A positive-working photosensitive resin composition useful as a photoresist material in the fine patterning work for the manufacture of semiconductor devices is proposed. The composition is excellent in the storage stability and capable of giving a patterned resist layer having good film thickness retention, cross sectional profile of line patterns, resolution and heat resistance. The composition comprises, in addition to a conventional alkali-soluble novolac resin as a film-forming agent and a quinone diazide group containing compound as a photosensitizing agent, a specific isocyanurate compound substituted at each nitrogen atom with a hydroxy- and ter-butyl-substituted benzyl group.

Abstract: The novel organosilicon compound of the invention is an alkoxysilane having a silicon-bonded C.sub.8 to C.sub.14 long-chain alkyl group substituted at the .omega.-position by a bromine atom or an amino (C.sub.2-6) alkyl-substituted amino group. Synthetic methods of such compounds are described and several examples of the compounds are given with their characterization data. The inventive compound having, in particular, the amino-alkyl-substituted amino group are useful as a surface-treatment agent of a silica filler as a water-resistant reinforcing filler in molding resin compositions.