Abstract: A photochemical polishing apparatus is disclosed in which the electromagnetic waves are provided by a waveguide in close proximity to the surface of a silicon wafer electrode.
Type:
Grant
Filed:
May 3, 2000
Date of Patent:
November 20, 2001
Assignee:
Rodel Holdings Inc.
Inventors:
Lizhong Sun, James Shen, Lee Melbourne Cook
Abstract: A method is provided for photochemical polishing of a silicon wafer using electromagnetic waves within the spectrum of 150 to 2000 nanometers wavelength. A photochemical polishing apparatus is also disclosed in which the electromagnetic waves are provided by a waveguide in close proximity to the surface of a silicon wafer electrode.
Type:
Grant
Filed:
August 21, 1997
Date of Patent:
June 13, 2000
Assignee:
Rodel Holdings, Inc.
Inventors:
Lizhong Sun, James Shen, Lee Melbourne Cook
Abstract: A novel cationic electrodepositable resin which offers reduced bake off lose, reduced yellowing of topcoats and very smooth film is disclosed. The backbone resin contains the basic polyepoxy amine adduct but it is crosslinked with a diol modified methylene diphenyl diisocyanate (MDI) which is blocked with a mixture of various alcohols.