Patents Represented by Attorney, Agent or Law Firm Hilmar Fricke
  • Patent number: 6319370
    Abstract: A photochemical polishing apparatus is disclosed in which the electromagnetic waves are provided by a waveguide in close proximity to the surface of a silicon wafer electrode.
    Type: Grant
    Filed: May 3, 2000
    Date of Patent: November 20, 2001
    Assignee: Rodel Holdings Inc.
    Inventors: Lizhong Sun, James Shen, Lee Melbourne Cook
  • Patent number: 6099954
    Abstract: A polishing pad for polishing hard surfaces such as glass and silicon wafers and a method of polishing using such a polishing pad.
    Type: Grant
    Filed: June 8, 1999
    Date of Patent: August 8, 2000
    Assignee: Rodel Holdings, Inc.
    Inventors: Walter J. Urbanavage, Heinz F. Reinhardt
  • Patent number: 6074546
    Abstract: A method is provided for photochemical polishing of a silicon wafer using electromagnetic waves within the spectrum of 150 to 2000 nanometers wavelength. A photochemical polishing apparatus is also disclosed in which the electromagnetic waves are provided by a waveguide in close proximity to the surface of a silicon wafer electrode.
    Type: Grant
    Filed: August 21, 1997
    Date of Patent: June 13, 2000
    Assignee: Rodel Holdings, Inc.
    Inventors: Lizhong Sun, James Shen, Lee Melbourne Cook
  • Patent number: 5070149
    Abstract: A novel cationic electrodepositable resin which offers reduced bake off lose, reduced yellowing of topcoats and very smooth film is disclosed. The backbone resin contains the basic polyepoxy amine adduct but it is crosslinked with a diol modified methylene diphenyl diisocyanate (MDI) which is blocked with a mixture of various alcohols.
    Type: Grant
    Filed: April 9, 1990
    Date of Patent: December 3, 1991
    Assignee: E. I. Du Pont de Nemours and Company
    Inventors: Tapan K. DeBroy, Ding Y. Chung