Patents Represented by Attorney Howard N. Flaxman

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  • Apparatus and method for selective area deposition of thin films on electrically biased substrates
    Patent number: 5354583
    Abstract: An ion beam deposition process for selective area deposition on a polarized substrate uses a potential applied to the substrate which allows the ionized particles to reach into selected areas for film deposition. Areas of the substrate to be left uncoated are held at a potential that repells the ionized particles.
    Type: Grant
    Filed: November 9, 1992
    Date of Patent: October 11, 1994
    Assignee: Martin Marietta Energy Systems, Inc.
    Inventors: Raymond A. Zuhr, Tony E. Haynes, Andrzej Golanski