Abstract: A method for delivering a process gas to a reaction chamber of a plasma processing system using a recipe having a recipe flow rate is provided. The method includes delivering the process gas by a gas flow delivery system controlled by a mass flow controller (MFC) to an orifice. The predicted flow rate is previously computed by pressurizing a gas. The predicted flow rate further being previously computed measuring a set of upstream pressure values of the gas via at least one pressure sensor. The method also includes applying, using a programmed computing device, a calibration factor of a set of calibration factors to determine the predicted flow rate, the calibration factor being a ratio of an average of the set of upstream pressure values to an average of a set of golden upstream pressure values.

Abstract: An arrangement for in-situ optical interrogation of plasma emission to quantitatively measure normalized optical emission spectra in a plasma chamber is provided. The arrangement includes a flash lamp and a set of quartz windows. The arrangement also includes a plurality of collimated optical assemblies, which is optically coupled to the set of quartz windows. The arrangement further includes a plurality of fiber optic bundles, which comprises at least an illumination fiber optic bundle, a collection fiber optic bundle, and a reference fiber optic bundle. The arrangement more over includes a multi-channel spectrometer, which is configured with at least a signal channel and a reference channel. The signal channel is optically coupled to at least the flash lamp, the set of quartz windows, the set of collimated optical assemblies, the illuminated fiber optic bundle, and the collection fiber optic bundle to measure a first signal.

Abstract: A method for aligning a substrate to a process center of a support mechanism is provided. The method includes determining substrate thickness after substrate processing at a plurality of orientations and at a plurality of radial distances from a geometric center of the substrate. The method also includes deriving a set of process rate values from substrate thickness and process duration. The method further includes creating for a process rate an off-centered plot, which represents a substantially concentric circle whose points are a circumference of the off-centered plot having substantially the first process rate. The method yet also includes applying a curve-fitting equation to the off-centered plot to determine a set of parameters. The method yet further includes teaching a set of robot arms the set of parameters, thereby enabling the set of robot arms to align another substrate that is supported by the support mechanism with the process center.

Abstract: An optimized activation prevention assembly for a gas delivery system is disclosed. The apparatus includes a pneumatically operated valve assembly. The apparatus also includes a toggle switch mechanically attached to the pneumatically operated valve assembly, the toggle switch includes a toggle arm, the toggle arm being positioned in one of an activation zone and a deactivation zone, wherein when the toggle arm is positioned in the activation zone, the pneumatically operated valve is activated, and wherein when the toggle arm is positioned in the deactivation zone, the pneumatically operated valve is deactivated. The apparatus further includes an activation prevention mechanism attached to the toggle switch, wherein when the activation prevention mechanism being configured for preventing the toggle arm from being repositioned from the deactivation zone to the activation zone without at least bypassing a lockout function of the optimized activation prevention mechanism.

Abstract: The present invention relates to a method for time display on a mobile phone. The method includes the following steps: step 1, in a standby state, set a pseudo power off identifier for the mobile phone; step 2, when the mobile phone identifies that the pseudo power off identifier is active, the mobile phone comes into a pseudo power off state; step 3, the mobile phone continually obtains a new time value through a physical layer clock, and displays the new time value on a LCD; and step 4, the mobile phone quits the pseudo power off state, and restarts. The present invention enables the mobile phone to display time without radio frequency signal by setting a third state, i.e., the pseudo power off state.

Abstract: An arrangement in a network device for monitoring network traffic is provided. The arrangement includes a set of network ports, which includes a set of input network ports for receiving the network traffic and a set of output network ports for outputting the network traffic from the network device. The arrangement also includes a switch chip, wherein the switch chip is configured at least for analyzing the network traffic. The arrangement further includes a set of monitoring ports, which is configured to receive the network traffic from the set of network ports. The arrangement yet also includes a tap module, which is configured at least for intercepting at least part of the network traffic flowing through the network device and forwarding at least part of the network traffic to at least one of the set of monitoring ports.

Abstract: A multiple integrated circuit arrangement within a single package is provided. The multiple integrated circuit arrangement includes a set of electronic components, which includes at least a set of dies. The first die of the set of dies is coupled to a first electronic component of the set of electronic components, wherein the first electronic component is not the first die. The arrangement includes a built-in-self-test (BIST) arrangement, which is at least partly encapsulated within the single package, wherein the BIST arrangement is configured for at least testing the first die of the set of dies. The arrangement also includes a built-in-self-repair (BISR) arrangement, which is at least partly encapsulated within the single package, wherein the BISR arrangement is configured for at least repairing the multiple integrated circuit arrangement.

Abstract: The present invention relates to a method for configuring and searching HS-SCCHs of a multi-carrier cell in a TD-SCDMA system.

Abstract: A method for minimizing microwave leakage into processing chamber of a microwave plasma system is provided. The method includes securing plasma traps to a plasma tube assembly, which is a cylindrical structure positioned upstream from the processing chamber and has a plasma-sustaining region. The plasma traps are electrically conductive disks surrounding the cylindrical structure and are positioned upstream from the processing chamber. The plasma traps include at least two electrically conductive disks. Each electrically conductive disk includes corrugated outer surfaces with plurality of corrugated peaks. The corrugated outer surface of the first electrically conductive disk is facing a corrugated outer surface of the second electrically conductive disk in a space-apart relationship to form an interstitial region between the electrically conductive disks.

Abstract: A computer-implemented method for implementing URL (Uniform Resource Locator) filtering is disclosed. The method includes receiving an access request for a webpage from a client, the access request being transmitted from a gateway device via a computer network and including at least a portion of a URL for the webpage. The method also includes ascertaining a rating for the at least the webpage. The method additionally includes providing a response to the gateway device via the computer network, the response including the rating and at least a cache hint that includes at least directory block caching for caching in a directory block of a local cache, domain block caching for caching in a domain block of the local cache, and do-not-cache for not caching in the local cache.

Abstract: A director device arrangement for performing a plurality of monitoring functions on data traffic traversing through a network is provided. The director device arrangement includes a power module, a processor module, a set of network ports, a set of switch modules, and at least one monitoring ports. The set of switch modules is configured to include at least a first switch module and a second switch module that interact with one another to perform the plurality of monitoring functions on the data traffic received. The at least one monitoring port is configured to receive at least one of the data traffic traversing through the network, whereas the data traffic is configured to traverse the director device arrangement between the set of network ports irrespective whether power is provided to the circuitry, the processor module, and the set of switch modules of the director device arrangement.

Abstract: A system for facilitating plasma processing tool component management across plurality of tools is provided. The system includes means for receiving first component data for first plurality of components, including identification and usage history for a first plurality of components, at first database associated with first tool. The system also includes means for receiving second component data for second plurality of components at second database associated with second tool, which is different from first tool. The system further includes means for synchronizing first and second component data with third database. The synchronizing includes synchronizing between third database and at least one of first and second database rules that govern usage of at least one component of first and second plurality of components. The third database is coupled to exchange data with plurality of tools.

Abstract: A plasma-processing tool for processing a substrate using at least a first process recipe and a second process recipe is provided. The plasma-processing tool includes transducers configured to collect process data streams, each process data stream pertaining to a process parameter being monitored during recipe execution. The tool also includes a logic circuitry configured for receiving a set of meta-data wherein each meta-data includes identification data about the substrate and the process recipe being executed. The logic circuitry is also configured for receiving a set of process data streams, each of which being associated with a specific process recipe. The logic circuitry further includes storing the meta-data and the process data streams associated with the first process recipe as a first file and the meta-data and the process data streams associated with the second process recipe as a second file.

Abstract: Methods using a probe apparatus configured to measure a set of electrical characteristics in a plasma include providing a chamber wall including at least a set of plasma chamber surfaces configured to be exposed to a plasma, the plasma having a set of electrical characteristics. The method includes installing a collection disk structure configured to be exposed to the plasma, wherein the collection disk structure having at least a body disposed within the chamber wall and a collection disk structure surface that is either coplanar or recessed with at least one of the set of plasma chamber surfaces and providing a conductive path configured to transmit the set of electrical characteristics from the collection disk structure to a set of transducers.

Abstract: A method for performing electronic signature verification for an entity is provided. The method includes creating a signature card for the entity by analyzing color change frequency of an initial electronic signature image. The method also includes comparing a second electronic signature image for the entity and the signature card to perform electronic signature verification.

Abstract: A method for facilitating connection between an entity's network and a first electronic device is provided. The method includes receiving, using an RFID (radio frequency identification) reader associated with the first electronic device, a first file from an RFID tag, the RFID tag being provided by the entity. The method also includes obtaining connection information from the first file, the connection information including at least one of a security policy and network configuration. The method further includes enabling a user to attempt to log in via the first electronic device, using the connection information, into the network, wherein the log in is attempted using a different connection modality than that employed to receive the first file from the RFID tag.

Abstract: A method for etching a substrate having a silicon layer in a plasma processing chamber having a bottom electrode on which the substrate is disposed on during etching. The method includes performing a main etch step. The method also includes terminating main etch step when a predefined etch depth of at least 70 percent of thickness into silicon layer is achieved. The method further includes performing an overetch step. The overetch step including a first process step and a second process step. First process step is performed using a first bottom power level applied to bottom electrode. Second process step is performed using a second bottom power level applied to bottom electrode that is lower than first bottom power level. First process and second process steps are alternately performed a plurality of times. The method yet also includes terminating overetch step after silicon layer is etched through.

Abstract: An arrangement for securing a wafer during substrate processing is provided. The arrangement includes a power supply and an electrostatic chuck (ESC). The ESC supports the wafer and includes a positive and a negative terminal. A positive high voltage is provided to the positive terminal through an RF filter and a negative high voltage is provided to the negative terminal through the RF filter. The arrangement also includes a first and a second trans-impedance amplifiers (TIAs) that measure a first set of voltages for determining a value of a positive load current applied to the positive terminal and a third and fourth TIAs that measure a second set of voltages for determining a value of a negative load current applied to the negative terminal. The arrangement yet also includes a program to adjust a bias voltage using the values of the positive load current and the negative load current.

Abstract: An apparatus for providing a plasma etch of a layer over a wafer is provided. A capacitively coupled process chamber is provided. A gas source is provided. A first and a second electrode are provided within the process chamber. A first radio frequency power source is electrically connected to at least one of the first and second electrodes, where the first radio frequency power source provides radio frequency power. A second radio frequency power source is electrically connected to at least one of the first and second electrodes. A first modulation control is connected to the first radio frequency power source, to provide a controlled modulation of the first radio frequency power source.

Abstract: A method, performed in connection with bevel etching of a substrate, for improving bevel-etch repeatability among substrates, is disclosed. The method includes providing an optical arrangement and ascertaining at least one bevel edge characteristic of a bevel edge of said substrate. The method also includes deriving at least one compensation factor from said at least one bevel edge characteristic, said at least one compensation factor pertaining to an adjustment in a bevel etch process parameter. The method further includes performing said bevel etching utilizing said at least one compensation factor.