Abstract: A method for establishing a mass flow controller (MFC) control scheme, which is configured for reducing a time scale for gas delivery into a processing chamber, for a recipe is provided. The method includes identifying a set of delayed gas species utilized during execution of the recipe with a set of delivery time slower than a target delivery time scale. The method also includes establishing an initial overshoot strength and an initial overshoot duration for each gas specie of the set of delayed gas species. The method further includes establishing MFC control scheme by adjusting an MFC hardware for each gas specie during the execution of the recipe. Adjusting the MFC hardware includes applying the initial overshoot strength for the initial overshoot duration to determine if the MFC control scheme provides for each gas specie a pressure profile within a target accuracy of an equilibrium pressure for the processing chamber.

Abstract: A method for etching a layer over a substrate in a process chamber, wherein the process chamber including a first electrode and a second electrode and the first electrode is disposed opposite of the second electrode is provided. The method includes placing the substrate on the second electrode and providing an etching gas into the process chamber. The method also includes providing a first radio frequency (RF) signal into the process chamber and modulating the first RF signal. The method further includes providing a second RF signal into the process chamber and modulating the second RF signal.

Abstract: A method for establishing a call rapidly in a cluster communication system based on code division multiple access, comprising the following steps: a dispatching station server transmitting a normal group call request to a base station subsystem after receiving a normal group call request sent by a calling terminal; the each base station in a dispatching area allocating resource and establishing a forward-reverse traffic channel required by a normal group call service in the base station side after receiving the normal group call request; each sector of the base station in the dispatching area sending a broadcast channel assignment message in a form of broadcast message to the terminals in an idle state in the sector in a forward control channel; the terminals in the sector comparing a broadcast address with a group identification stored, if matching, the terminal establishing each service channel in the side of the terminal in the called state according to the broadcast channel assignment message received; if

Abstract: An arrangement for processing data traffic flowing through a network is provided. The arrangement includes a data interface for receiving the data traffic. The arrangement also includes an inspection engine for analyzing the data traffic, wherein the analyzing is performed on at least payload data. The arrangement further includes means for routing the data traffic through the network, wherein the means for routing is configured to define one or more ports for transmitting the data traffic. The means for routing the data traffic is dynamic to balance the data traffic across multiple outgoing ports.

Abstract: Methods and apparatus for implementing input data security processing on user input data are disclosed. The user input data is entered on a webpage that contains a destination specification for an intermediary security service and an encrypted destination specification for a receiving module of the application program. The user input data is first sent to the intermediary security service for performing input data security processing on the user input data. If the user input data is deemed acceptable, the user input data is sent to the receiving module by decrypting the encrypted destination specification for the receiving module to obtain the destination specification for the receiving module and transmitting the user data to the receiving module using the destination specification for the receiving module.

Abstract: An active response network tap for use in monitoring a network comprises a first device interface terminal, a second device interface terminal, a first monitor interface terminal, and a second monitor interface terminal. A tap structure is coupled to the first device interface terminal, second device interface terminal, first monitor interface terminal and second monitor interface terminal. A memory is coupled to the tap structure and configured to store data. In one aspect, the tap structure is configured to communicate full-duplex traffic between the tap structure and a monitor device coupled to a monitor interface terminal. In another aspect, the tap structure is configured to insert data from a monitor coupled to the first monitor interface into the traffic between the first device and the second device. Advantages of the invention include the ability to provide monitor access to a network while also supporting communication with other network devices.

Abstract: A plasma processing system for processing a wafer is provided. The system includes an electrostatic chuck (ESC) positioned inside a plasma processing chamber and configured to support the wafer. The ESC includes a positive terminal for providing a first force to the wafer and a negative terminal for providing a second force to the wafer. The system also includes a first circuit arrangement configured to measure at least a first voltage for determining a value of a positive load current applied to the positive terminal. The system further includes a second circuit arrangement configured to measure at least a second voltage for determining a value of a negative load current applied to the negative terminal. The system yet also includes circuitry configured to adjust a bias voltage using the values of the positive load current and the negative load current for balancing the first force and the second force.

Abstract: A method for generating plasma for removing an edge polymer from a substrate is provided. The method includes providing a powered electrode assembly, which includes a powered electrode, a dielectric layer, and a wire mesh disposed between the powered electrode and the dielectric layer. The method also includes providing a grounded electrode assembly disposed opposite the powered electrode assembly to form a cavity wherein the plasma is generated. The wire mesh is shielded from the plasma by the dielectric layer when the plasma is present in the cavity, which has an outlet at one end for providing the plasma to remove the edge polymer. The method further includes introducing at least one inert gas and at least one process gas into the cavity. The method yet also includes applying an RF field to the cavity using the powered electrode to generate the plasma from the inert gas and process gas.

Abstract: A method for predicting etch rate uniformity for qualifying health status of a processing chamber during substrate processing of substrates is provided. The method includes executing a recipe and receiving processing data from a first set of sensors. The method further includes analyzing the processing data utilizing a subsystem health check predictive model to determine calculated data, which includes at least one of etch rate data and uniformity data. The subsystem health check predictive model is constructed by correlating measurement data from a set of film substrates with processing data collected during analogous processing of a set of non-film substrates. The method yet also includes performing a comparison of the calculated data against a set of control limits as defined by the subsystem health check predictive model. The method yet further includes generating a warning if the calculated data is outside of the set of control limits.

Abstract: A method and apparatus for improving the system response time when URL filtering is employed to provide security for web access. The method involves gathering the attributes of the user, and pre-populating a local URL-rating cache with URLs and corresponding ratings associated with analogous attributes from a URL cache database. Thus, the cache hit rate is higher with a pre-populated local URL rating cache, and the system response time is also improved.

Abstract: A method and apparatus for processing a substrate in a capacitively-coupled plasma processing system having a plasma processing chamber and at least an upper electrode and a lower electrode. The substrate is disposed on the lower electrode during plasma processing. The method includes providing at least a first RF signal, which has a first RF frequency, to the lower electrode. The first RF signal couples with a plasma in the plasma processing chamber, thereby inducing an induced RF signal on the upper electrode. The method also includes providing a second RF signal to the upper electrode. The second RF signal also has the first RF frequency. A phase of the second RF signal is offset from a phase of the first RF signal by a value that is less than 10%. The method further includes processing the substrate while the second RF signal is provided to the upper electrode.

Abstract: A method for matching an image-form textual string in an image to a regular expression is disclosed. The method includes constructing a representation of the regular expression and generating a candidate string of characters from the image-form textual string. The method further includes ascertaining whether there exists a match between the image-form textual string and the regular expression, the match is deemed achieved if a probability value associated with the match is above a predetermined matching threshold.

Abstract: Methods for detecting an attempt to perpetrate fraud on a user utilizing a client-supplied link and a client-supplied IP address from a user computer. The method ascertains a first autonomous system number (“first AS number”) from the client-supplied IP address and a second autonomous system number (“second AS number”) from the client-supplied link. If the first AS number and the second AS number are not AS group peers, a pharming attempt is detected. Alternatively or additionally, the method includes analyzing a content of a webpage that is accessed using the client-supplied IP address to ascertain an identity of an apparent owner of the webpage and ascertaining a third autonomous system number (“third AS number”) from the identity of the apparent owner of the webpage. If the first AS number and the third AS number are not AS group peers, a phishing attempt is detected.

Abstract: A method in a plasma processing system for etching a feature through a given layer on a semiconductor substrate. The method includes placing the substrate in a plasma processing chamber of the plasma processing system. The method also includes flowing an etchant gas mixture into the plasma processing chamber, the etchant gas mixture being configured to etch the given layer. The method additionally includes striking a plasma from the etchant source gas. Furthermore, the method includes etching the feature at least partially through the given layer while applying a bias RF signal to the substrate, the bias RF signal having a bias RF frequency of between about 45 MHz and about 75 MHz. The bias RF signal further has a bias RF power component that is configured to cause the etch feature to be etched with an etch selectivity to a second layer of the substrate that is higher than a predefined selectivity threshold.

Abstract: Methods and arrangements for controlling the electron loss to the upper electrode, including techniques and apparatus for biasing the upper electrode more negatively to allow charged species to be trapped within the plasma chamber for a longer period of time, thereby increasing the plasma density may be increased. The induced RF signal on the upper electrode is rectified, thus biasing the upper electrode more negatively. The rectified RF signal may also be amplified, thus driving the upper electrode even more negatively, if desired.

Abstract: In a plasma processing chamber, a method for processing a substrate is provided. The substrate is disposed above a chuck and surrounded by an edge ring, which is electrically isolated from the chuck. The method includes providing first RF power to the chuck. The method also includes providing an edge ring RF voltage control arrangement, which is coupled to the edge ring to provide second RF power to the edge ring. The second RF power being delivered to the edge ring has a frequency of about 20 KHz to about 10 MHz, resulting in the edge ring having anedgering potential. The method further includes generating a plasma within the plasma processing chamber to process the substrate, the substrate being processed while the edge ring RF voltage control arrangement is configured to control the second RF power to the edge ring such that a predefined potential difference is maintained between the edge ring and the substrate.

Abstract: A method for confining plasma within a plasma processing chamber while processing a substrate is provided. The method includes igniting the plasma within a plasma generating area, wherein the plasma generating area is surrounded by a set of confinement rings. The method also includes providing a chamber wall outside of the set of confinement rings. The method further includes providing a dielectric liner electrode arrangement positioned between the chamber wall and the set of confinement rings, wherein the dielectric liner electrode arrangement having an electrode encapsulated within a dielectric liner, the dielectric liner electrode arrangement being coupled with the chamber wall to create a modified chamber wall. The method yet also includes providing a parallel LC circuit arrangement, the parallel LC circuit arrangement being coupled between the dielectric liner electrode arrangement and the chamber wall.

Abstract: An arrangement for detecting plasma instability within a processing chamber of a plasma processing system during substrate processing is provided. The arrangement includes a probe arrangement, wherein the probe arrangement is disposed on a surface of the processing chamber and is configured to measure at least one plasma processing parameter. The probe arrangement includes a plasma-facing sensor and a measuring capacitor, wherein the plasma-facing sensor is coupled to a first plate of the measuring capacitor. The arrangement also includes a detection arrangement, which is coupled to a second plate of the measuring capacitor. The detection arrangement is configured to convert an induced current flowing through the measuring capacitor into a set of digital signals, the set of digital signals being processed to detect the plasma instability.

Abstract: A subscriber-based sales leads exchange system and method for efficiently maximizing revenue to lead sellers and for providing high quality, temporally relevant sales leads to lead buyers based on a transaction between a lead seller and a customer of said lead seller.

Abstract: A method for characterizing deposited film on a substrate within a processing chamber during processing is provided. The method includes determining voltage-current characteristic for a probe head when measuring capacitor is set at a first capacitance value. The method also includes applying RF train to the probe head when measuring capacitor is set at a capacitance value greater than first capacitance value. The method further includes providing an initial resistance value and an initial capacitance value for the deposited film. The method yet also includes employing initial resistance value, initial capacitance value, and voltage-current characteristic to generate simulated voltage-time curve. The method yet further includes determining measured voltage-time curve, which represents potential drop across the deposited film for one RF train. The method more over includes comparing the two curves.