Abstract: A capacitance height gage for positioning the reticle of an electron beam lithography apparatus. The gage includes a hybrid circuit substrate carrying four measuring and two reference capacitor circuits. Each has a driven plate, the four measuring plates disposed opposite the object surface to be measured, and the two reference plates disposed on the top of the substrate. Two ground plates are disposed a predetermine distance from the reference driven plates. The object surface comprises the ground plate for the four measuring driven plates. The reference plates calibrate the measuring plates.