Abstract: A chemical vapor deposition method for forming fluorine-doped tin oxide coatings uses a liquid coating composition which includes an organic fluorine dopant and an organotin compound. In the method, the gas stream contains sufficient water vapor such that its relative humidity at 18.degree. C. is about 6% to 100%. A preferred liquid coating composition is monobutyltin trichloride and trifluoroacetic acid.
Abstract: An improved activation solution is provided for forming adherent chromium electrodeposits on metal substrates from high energy efficient chromium baths. The solution is a substantially neutral alkali metal sulfate solution.
Type:
Grant
Filed:
August 9, 1985
Date of Patent:
April 29, 1986
Assignee:
M&T Chemicals Inc.
Inventors:
Warren H. McMullen, Hyman Chessin, Allen R. Jones
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