Abstract: An etching process is provided using electromagnetic radiation and a selected etchant (52) to selectively remove various types of materials (53) from a substrate (48). Contacts (49, 56, 64) may be formed to shield the masked regions (51) of the substrate (48) having an attached coating (20) during irradiation of the unmasked regions (53) of the substrate (48). The unmasked regions (53) are then exposed to an etchant (52) and irradiated to substantially increase their reactivity with the etchant (52) such that the etchant (52) etches the unmasked regions (53) substantially faster than the masked regions (51) and the contacts (49, 56, 64).

Abstract: There is disclosed a micro-mechanical switch mounted on a waveguide structure that can be utilized as a switching device in optical networks. The device comprises an individually deflectable element suspended over a gap in a waveguide. The individually deflectable element has attached to its underside a vertical metal shutter which can be raised or lowered by the movement of the element. The raising or lowering of the shutter is used to control light propagating through the waveguide.