Abstract: The present invention relates to optical fiber coating systems capable of providing a high degree of microbend protection to an optical fiber, and an optical fiber coated therewith. According to one embodiment of the invention, an optical fiber coating system includes a primary coating and a secondary coating, wherein when a ribbon having twelve large effective area optical fibers coated with the coating system is subjected to the ribbon optical performance test at a wavelength of 1550 nm, the average change in attenuation is about 0.020 dB/km or less.

Abstract: The present invention provides methods for manufacturing microstructured optical fibers having an arbitrary core size and shape. According to one embodiment of the invention, a method of fabricating a photonic band gap fiber includes the steps of forming an assembly of stacked elongate elements, the assembly including a first set of elongate elements, the first set of elongate elements defining and surrounding a core volume, and a second set of elongate elements surrounding the first set of elongate elements, wherein the core volume defined by the first set of elongate elements has a shape that is not essentially an integer multiple of the external shape of the elongate elements of the second set of elongate elements; including the assembly in a photonic band gap fiber preform; and drawing the photonic band gap fiber preform into the photonic band gap fiber.

Abstract: In accordance with an exemplary embodiment of the present invention, an optical apparatus includes a glass monolithic structure including a plurality of optical filter elements, and the glass monolithic structure is not an optical fiber. In accordance with another exemplary embodiment of the present invention, an optical apparatus includes a glass monolithic structure which includes a plurality of optical filter elements. The optical apparatus further includes a device which selectively aligns an optical input and an optical output to one of said plurality of optical filter elements. In accordance with another exemplary embodiment of the present invention, a method of adding/dropping a particular frequency from an optical signal includes providing a glass monolithic structure which further includes a plurality of optical filter elements. The method further includes providing a device which selectively aligns an optical input and an optical output to one of the plurality of optical filters.

Abstract: The present invention provides devices and methods for dispersion compensation. According to one embodiment of the invention, a dispersion compensating device includes a negative dispersion fiber having an input configured to receive the optical signal, the negative dispersion fiber having a length and dispersion sufficient to remove any positive chirp from each wavelength channel of the optical signal, thereby outputting a negatively chirped optical signal; an amplifying device configured to amplify the negatively chirped optical signal; and a nonlinear positive dispersion fiber configured to receive the negatively chirped optical signal. The devices of the present invention provide broadband compensation for a systems having a wide range of variable residual dispersions.

Abstract: The present invention provides materials suitable for use as secondary coatings of optical fibers. According to one embodiment of the invention, a curable composition includes an oligomer and at least one monomer, which when cured forms a cured polymeric material having a Young's modulus of at least about 1200 MPa, and a fracture toughness of at least about 0.7 MPa·m1/2. According to another embodiment of the invention, a coated optical fiber includes an optical fiber; a primary coating encapsulating the optical fiber; and a secondary coating encapsulating the primary coating, the secondary coating having a Young's modulus of at least about 1200 MPa, and a fracture toughness of at least about 0.7 MPa·m1/2.

Abstract: A microstructured optical fiber is described. The microstructured optical fiber comprises an inner region and an outer region. The inner region includes an inner material and a plurality of holes formed in the inner material. The outer region surrounds the inner region, and includes an outer material. The softening point temperature of the inner material is greater than the softening point temperature of the outer material by at least about 50° C. Microstructured optical fiber preforms and methods for making the microstructured optical fibers are also described. The microstructured optical fiber may be made to have substantially undistorted holes in the inner region.

Abstract: The present invention relates generally to UV (ultraviolet) photosensitive bulk glass, and particularly to batch meltable alkali boro-alumino-silicate and germanosilicate glasses. The photosensitive bulk glass of the invention exhibits photosensitivity to UV wavelengths below 300 nm. The photosensitivity of the alkali boro-alumino-silicate and germanosilicate bulk glasses to UV wavelengths below 300 nm provide for the making of refractive index patterns in the glass. With a radiation source below 300 nm, such a laser, refractive index patterns are formed in the glass. The inventive photosensitive optical refractive index pattern forming bulk glass allows for the formation of patterns in glass and devices which utilize such patterned glass.

Abstract: Methods of manufacturing stoichiometric lithium niobate elements are provided. The method involves heating lithium niobate substrates in the presence of a monolithic sintered source of lithium and/or niobium. The method is useful for producing lithium niobate optical elements such as waveguides, switches and modulators.

Abstract: Methods and apparatus for producing fused silica members having high internal transmission are disclosed. The apparatus and methods are capable of producing fused silica having internal transmission of at least 99.65%/cm at 193 nm.

Abstract: A method of writing a light guiding structure in a bulk glass substrate including selecting a bulk glass substrate made from a soft silica-based material; and focusing an excimer laser beam at a focus within said substrate while translating the focus relative to the substrate along a scan path at a scan speed effective to induce an increase in the refractive index of the material along the scan path relative to that of the unexposed material while incurring substantially no laser induced breakdown of the material along the scan path. Various optical devices, including waveguides can be made in this way.

Abstract: Optical isolators and methods of manufacturing optical isolators are disclosed. The optical isolators are manufactured by directly bonding the parts of the isolators without the use of adhesive or mechanical devices to hold the individual parts together.

Abstract: Disclosed is a photonic band-gap crystal waveguide having the physical dimension of the photonic crystal lattice and the size of the defect selected to provide for optimum mode power confinement to the defect. The defect has a boundary which has a characteristic numerical value associated with it. The ratio of this numerical value to the pitch of the photonic crystal is selected to avoid surface modes found to exist in certain configurations of the photonic band-gap crystal waveguide. Embodiments in accord with the invention having circular and hexagonal defect cross sections are disclosed and described. A method of making the photonic band-gap crystal waveguide is also disclosed and described.

Abstract: Germanium-silicon oxide, germanium-silicon oxynitride and silica-germania-titania materials and oxynitride materials suitable for fabricating optical waveguides for liquid crystal based cross-connect optical switching devices have a refractive index of from about 1.48 to about 1.52 at 1550 nm, and a coefficient of thermal expansion at room temperature of from about 3×10−6° C.−1 to about 4.4×10−6° C.−1. The compositions are adjusted so that the refractive index of the germanium-silicon oxide, germanium-silicon oxynitride or silica-germania-titania material is closely matched to the refractive index of a typical liquid crystal material whereby improved optical performance of a liquid crystal based cross-connect optical switching device is achieved.

Abstract: A method of making an EUV lithography stage structure includes depositing a layer of a Ti doped SiO2 glass powder in a confined region to provide an underlying layer; applying a binder to form a primitive with the binder bonding the glass powder together at one or more selected regions; depositing an above layer of the glass powder above the deposited layer; applying the binder to the above layer with the binder bonding the glass powder together at one or more selected regions; repeating the deposition and binding steps to produce a number of successive layers with the binder bonding the successive layers together; and removing the unbonded glass powder to provide a bonded glass powder lithography stage structure which is then sintered and densified into a densified nonpowder glass lithography stage.

Abstract: A method and furnace are described for producing a fused oxide body by decomposing a precursor compound of the oxide in a flame to form molten oxide particles and collecting those particles in a furnace constructed of a refractory material to form a fused oxide body, the improvement in the method comprising treating the refractory material with a strong acid in liquid form to react with, and thereby remove, contaminants from at least the surface of the refractory material.

Abstract: A method for automating measurement of an optical property of a sample includes selecting a measurement aperture around a reference point on the sample (38), generating a set of grid nodes that fall within the measurement aperture (68), calculating the radial distance of each node with respect to a reference point within the measurement aperture, and calculating the angular position of each node with respect to the vertical. The method also includes moving a light source (32) and a light detector along the vertical and rotating the sample to measurement positions in which the light source and the light detector are aligned with one of the nodes in the measurement aperture, and measuring the optical property at the measurement position by energizing the light source and interrogating the detector. The calculated radial distances and angular positions are used to control positioning of the light source and the light detector and rotation of the sample.

Abstract: Lithographic methods are disclosed. In one such method, a pulsed ultraviolet radiation source for producing ultraviolet lithography radiation having a wavelength shorter than about 300 nm at a fluence of less than 10 mJ/cm2/pulse and a high purity fused silica lithography glass having a concentration of molecular hydrogen of between about 0.02×1018 molecules/cm3 and about 0.18×1018 molecules/cm3 are provided. A lithography pattern is formed with the ultraviolet lithography radiation; the lithography pattern is reduced to produce a reduced lithography pattern; and the reduced lithography pattern is projected onto a ultraviolet radiation sensitive lithography medium to form a printed lithography pattern. At least one of the forming, reducing, and projecting steps includes transmitting the ultraviolet lithography radiation through the high purity fused silica lithography glass. Lithography systems and high purity fused silica lithography glass are also described.

Abstract: The present invention provides an electro-optic ceramic material including lead, zinc and niobium having a propagation loss of less than about 3 dB/cm and a quadratic electro-optic coefficient of greater than about 1×10−6 m2/V2 at 20° C. at a wavelength of 1550 nm. The present invention also provides electro-optic devices including an electro-optic ceramic material including lead, zinc and niobium having a propagation loss of less than about 3 dB/cm and a quadratic electro-optic coefficient of greater than about 1×10−16 m2 V at 20° C. at a wavelength of 1550 nm. The materials and devices of the present invention are useful in optical communications applications such as intensity and phase modulation, switching, and polarization control.

Abstract: The present invention provides photonic devices utilized in optical telecommunications. The photonic devices include photosensitive bulk glass bodies which contain Bragg gratings, particularly with the ultraviolet photosensitive bulk glass bodies directing optical telecommunications wavelength range bands. Preferably the ultraviolet photosensitive bulk glass bodies are batch meltable alkali boro-alumino-silicate bulk glass bodies. One embodiment of the invention relates to an optical element including a transparent photosensitive bulk glass having formed therein a non-waveguiding Bragg grating; and a optical element optical surface for manipulating light. Desirably, the photosensitive bulk glass has a 250 nm absorption less than 10 dB/cm.

Abstract: A polarization mode dispersion compensator corrects polarization mode dispersion in an optical signal having a fast polarization mode component, a slow polarization mode component and a time differential between the components. The compensator includes a phase shifter and a variable delay section. An input of the phase shifter is coupled to an optical device that provides an optical signal that exhibits polarization mode dispersion. The phase shifter functions to rotate the optical signal principal states of polarization to a desired orientation. The phase shifter engages a segment of an optical fiber that is coated with a radiation cured coatings. The coating composition is selected so that in response to a preload comprising the application of a stress of about 80 MPa to said coating at about 80° C. and after a stress-relaxation period of at least about 1 hour, at about 80° C.