Patents Represented by Attorney James Wilson

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  • Etching silicon-containing materials by use of silicon-containing compounds
    Patent number: 5705433
    Abstract: During the etching of a silicon-containing material using a halogen-containing etch gas, a silicon-hydride gas is added to the etch gas to provide increased sidewall protection during the etch. Suitably up to about 50 percent by volume of a silicon-containing gas such as silane is added to improve anisotropy of the etch and to prevent notching at the silicon-substrate interface.
    Type: Grant
    Filed: August 24, 1995
    Date of Patent: January 6, 1998
    Assignee: Applied Materials, Inc.
    Inventors: Dale A. Olson, Xue-Yu Qian, Patty Hui-ing Tsai