Abstract: The present invention concerns a process for modifying oxidizable surfaces, including diamond surfaces, including methods for metallizing these surfaces, where these methods include oxidation of these surfaces. The present invention also relates to the products of these methods. In this process, a surface is first plasma oxidized, usually under an RF O2 plasma. Chemical functional groups are then attached to the surface. If the surface is to be metallized, the chemical functional groups are selected to be catalyzable, the surface is then catalyzed for electroless metallization, and the surface is finally treated with an electroless plating solution to metallize the surface. If modified surface is to be patterned, the modified surface is exposed through a mask to pattern the surface after the attachment of the chemical functional groups.