Abstract: A miniaturized construction and slit end orifice configurations of a constricted glow discharge chamber and method are disclosed. The polarity and geometry of the constricted glow discharge plasma source is set so that the contamination and energy of the ions discharged from the source are minimized. The several sources can be mounted in parallel and in series to provide a sustained ultra low source of ions in a homogeneous linear plasma stream with contamination below practical detection limits. Other configuration include a hollow chamber with an anode outside the chamber located opposite its discharge constriction orifice. The constriction orifice may be circular or a slit and can be aligned to form a linear array for processing web substrates.

Abstract: An invented corkscrew machine includes a rotatable spiral radius pinion gear mechanically coupled to an annular collar and engaging an inclined gear rack for translating a driver up and down carrying a freely rotating, helical corkscrew. A crank rotates the spiral radius pinion gear for translating the driver up and down relative to the collar the along the rotation axis of the corkscrew with a mechanical advantage that increases as driver approaches the collar. A non-rotating collar cam coupled to and translatable relative to the driver, receives and follows the helix of the corkscrew for imparting torque rotating the corkscrew when held stationary within the annular collar responsive to translation of the driver toward and away from the annular collar.

Abstract: A jewelry connection system utilizing an elastic bent stem having a narrow center section is inserted into a hollow tube such that binding of the stem ends in the tube creates an elastic releasable friction bond (binding) between the stem and tube pieces. A controlled amount of binding can be introduced by controlling the degree of non-colinearity between mating surfaces such that when using a high modulus material, such as Titanium, the use of this system for body piercing openings such as ear and nose rings is successful without reduced risk of loss of jewelry pieces due to vibration, because threaded connections in this arrangement are avoided. Configurations according to the invention can be used in a variety of tiny jewelry pieces as long as a stem can be inserted into a stem receiving member.

Abstract: An apparatus and method for controlling an array of constricted glow discharge chambers are disclosed. More particularly a linear array of constricted glow plasma sources whose polarity and geometry are set so that the contamination and energy of the ions discharged from the sources are minimized. The several sources can be mounted in parallel and in series to provide a sustained ultra low source of ions in a plasma with contamination below practical detection limits. The quality of film along deposition "tracks" opposite the plasma sources can be measured and compared to desired absolute or relative values by optical and/or electrical sensors. Plasma quality can then be adjusted by adjusting the power current values, gas feed pressure/flow, gas mixtures or a combination of some or all of these to improve the match between the measured values and the desired values.

Abstract: A constricted glow discharge chamber and method are disclosed. The polarity and geometry of the constricted glow discharge plasma source is set so that the contamination and energy of the ions discharged from the source are minimized. The several sources can be mounted in parallel and in series to provide a sustained ultra low source of ions in a plasma with contamination below practical detection limits. The source is suitable for applying films of nitrides such as gallium nitride and oxides such as tungsten oxide and for enriching other substances in material surfaces such as oxygen and water vapor, which are difficult process as plasma in any known devices and methods. The source can also be used to assist the deposition of films such as metal films by providing low-energy ions such as argon ions.

Abstract: A passive radiator and method is disclosed which improves frequency response linearity and greatly reduces the possibility that wobble of a passive radiator which will occur without the displacement limitations of a spider containing speaker structure. Two substantially flat surfaced speaker diaphragms are tied together and supported by two sets of surrounds oriented in opposite directions to reduce the non-linearity in the surround spring rate and improve low frequency sound generation.

Abstract: A transformable travel (neck) pillow is disclosed having two configurations: one, where the granular fill contents of the pillow are positioned in a collar end of a pillowcase to form a horseshoe-shaped type of pillow enclosure similar to neck pillows known at this time. Alternately, a flap of the pillowcase may be released and fill material allowed to move to a plain end of the pillow so that two tubular end sections which formerly formed the collars of the neck pillow are now empty and can be folded over the side of the pillowcase to form a rectangular-type pillow. It is expected that such a pillow would be used with organic granular-type fill materials, such as buckwheat husks (hulls).

Abstract: The invention is a method and device for sealing leaks remotely by means of injecting a previously prepared aerosol into the enclosure being sealed according to a particular sealing efficiency defined by the product of a penetration efficiency and a particle deposition efficiency. By using different limits in the relationship between penetration efficiency and flowrate, the same method according the invention can be used for coating the inside of an enclosure. Specifically the invention is a method and device for preparing, transporting, and depositing a solid phase aerosol to the interior surface of the enclosure relating particle size, particle carrier flow rate, and pressure differential, so that particles deposited there can bridge and substantially seal each leak, with out providing a substantial coating at inside surfaces of the enclosure other than the leak.

Abstract: An exclusion ring system for depositing a film with multiple exclusion zones on a substrate in a deposition apparatus having a pedestal for supporting the substrate at different positions. A first exclusion ring is positioned above the substrate and pedestal and extends over a first zone overlying the perimeter of the substrate up to a first inner periphery. A second ring is positioned between the first ring and the substrate and extends over a second zone overlying the perimeter of the substrate outwardly of the first zone to a second inner periphery lying outwardly of the first inner periphery. When the pedestal is in a raised position, it supports the rings. When the pedestal is in a lowered position, the rings are supported by legs resting on a stationary wall, the legs of the first ring being effectively longer than the legs of the second ring so that the rings are sequentially moved away from the substrate as the pedestal is lowered.

Abstract: This invention relates to a structure and method for using heat pipe technology in combination with a ceramic dome of a vacuum processing chamber to help maintain the uniformity of temperature in the dome and avoid differences in temperature in the dome which may cause deleterious flaking of process deposition, or allow elevated temperatures in the dome to cause premature wear of the material. A heat pipe can be in thermal contact with the dome (process chamber surface) or can actually be part of the heat pipe/dome structure.

Abstract: A process chamber for semiconductor wafers is formed of multiple compartments. A first compartment is provided for supplying an isolated environment for processing the wafers, and a second compartment is provided, in selective communication with the first compartment, to load and unload wafers from the chamber. The wafer handling equipment is located in the second compartment to isolate it from the process environment, and thus form a clean, non-contaminating, environment for the wafer handling equipment. When the chamber must be cleaned, only the first compartment must be cleaned, as no processing occurs in the second chamber. Therefore, the entire first chamber may be removed for cleaning, and replaced with a clean first compartment to decrease chamber turnaround time during chamber cleaning operations.