Abstract: This invention pertains to electronic/optoelectronic devices with reduced extended defects and to a method for making it. The method includes the steps of depositing a dielectric thin film mask material on a semiconductor substrate surface; patterning the mask material to form openings therein extending to the substrate surface; growing active material in the openings; removing the mask material to form the device with reduced extended defect density; and depositing electrical contacts on the device.
Type:
Grant
Filed:
January 23, 2004
Date of Patent:
April 3, 2007
Assignee:
The United States of America as represented by the Secretary of the Navy
Inventors:
Martin Peckerar, Richard Henry, Daniel Koleske, Alma Wickenden, Charles R. Eddy, Jr., Ronald Holm, Mark E. Twigg