Abstract: A tunable nanomechanical near-field grating is disclosed which is capable of varying the intensity of a diffraction mode of an optical output signal. The tunable nanomechanical near-field grating includes two sub-gratings each having line-elements with width and thickness less than the operating wavelength of light with which the grating interacts. Lateral apertures in the two sub-gratings are formed from the space between one line-element of the first sub-grating and at least one line-element of the second sub-grating. One of the sub-gratings is capable of motion such that at least one of aperture width and aperture depth changes, causing a perturbation to the near-field intensity distribution of the tunable nanomechanical near-field grating and a corresponding change to the far-field emission of thereof.

Abstract: A thermally-induced voltage alteration (TIVA) apparatus and method are disclosed for analyzing a microelectromechanical (MEM) device with or without on-board integrated circuitry. One embodiment of the TIVA apparatus uses constant-current biasing of the MEM device while scanning a focused laser beam over electrically-active members therein to produce localized heating which alters the power demand of the MEM device and thereby changes the voltage of the constant-current source. This changing voltage of the constant-current source can be measured and used in combination with the position of the focused and scanned laser beam to generate an image of any short-circuit defects in the MEM device (e.g. due to stiction or fabrication defects). In another embodiment of the TIVA apparatus, an image can be generated directly from a thermoelectric potential produced by localized laser heating at the location of any short-circuit defects in the MEM device, without any need for supplying power to the MEM device.