Abstract: A pattern selection system for a sewing machine is provided by which operator influenced closure of a single electric switch can effect the selection of any one of a multiplicity of stitch patterns stored in an electronic memory in the sewing machine. Pattern selection can be effected either by repeated closure of the single switch, by a scanning system rendered effective by continuous closure of the single switch, or by a combination of both of these modes. This system is compatible with the provision of additional individual pattern selection switches for selecting special or frequently utilized individual patterns.