Abstract: An improved circuit breaker having an improved shield apparatus provides protection to components that are internal to the circuit breaker during an arc event. A contact arm carrier assembly of the circuit breaker comprises a number of springs that bias a number of movable contacts that are disposed on contact arms into engagement and electrical connection with a stationary contact. The shield apparatus is disposed on a carrier housing of the contact arm carrier assembly and is situated adjacent the springs. A shield member of the shield apparatus is biased into engagement with the contact arms. When the circuit breaker is moved between the ON position and the OFF or TRIPPED positions, the shield of the shield apparatus moves between a retracted position and a deployed position, with the shield remaining in engagement with the contact arms and protecting the springs from damage in an arc event. In one embodiment, the shield member is formed of a material that generates gases when struck by an arc.

Abstract: A shaft assembly is provided for an electrical switching apparatus, such as a circuit breaker. The circuit breaker includes a housing and a pivotal shaft. The shaft assembly includes a paddle assembly comprising an elongated body including a first end and a second end disposed opposite and distal from the first end. A number of paddles extend radially outwardly from the elongated body. A support bracket is coupled to the housing of the circuit breaker. The first end of the elongated body is coupled to and supported by the pivotal shaft, and the second end of the elongated body is coupled to and supported by the support bracket. The support bracket is preferably an accessory mounting bracket. The paddle assembly preferably further includes a separate molded member. When the separate molded member moves, the elongated body moves. However, the elongated body is pivotable independently from the separate molded member.

Abstract: A load conductor is provided for an electrical switching apparatus, such as a circuit breaker. The circuit breaker includes a housing having a number of recesses. The load conductor includes first and second opposing sides, an intermediate portion extending between the first and second sides, and a number of protrusions extending outwardly from the second side. Each of the protrusions is disposed within a corresponding one of the recesses of the housing to secure the load conductor without a separate fastener.

Abstract: An electrical switching apparatus includes a number of poles each having an elongated conductor with a first end and an opposite second end with a first terminal member. A circuit interrupter is electrically connected in series with the elongated conductor at the first end. A second terminal member electrically engages the first terminal member. A number of insulative skirts are disposed on the elongated conductor between opposite ends thereof. An insulative tube receives the insulative skirts and includes a first open end and an opposite second end carrying the second terminal member. A carrier carries the poles between (a) a first position in which the first terminal member electrically engages the second terminal member and the insulative tube receives the insulative skirts, and (b) a second position in which the first terminal member is electrically disconnected from the second terminal member and the skirts are withdrawn from the insulative tube.

Abstract: A mounting assembly is provided for an electrical switching apparatus, such as a circuit breaker. The circuit breaker includes a housing having an exterior and an interior, separable contacts disposed in the interior, and an operating mechanism structured to open and closed the separable contacts. The exterior of the housing includes a recess. The mounting assembly includes a bracket assembly having at least one bracket, an expansion member coupled to a corresponding one of the at least one bracket and being disposed within the recess on the exterior of the housing, and an actuator movably coupled to the expansion member. The actuator is movable between an actuated position corresponding to the expansion member expanding outwardly within the recess to secure the mounting assembly to the circuit breaker, and an unactuated position corresponding to the expansion member not being expanded and the mounting assembly being removable from the circuit breaker.

Abstract: A limiter includes a housing having a number of gas ports, a number of gas vents and a number of gas channels. Each of the number of gas channels is between a corresponding one of the number of gas ports and a corresponding one of the number of gas vents. The limiter also includes a number of first terminals, a number of second terminals, and a number of limiter devices. Each of the number of limiter devices is electrically connected between a corresponding one of the number of first terminals and a corresponding one of the number of second terminals. Each of the number of gas ports is structured to receive a corresponding ionized gas flow for passage through a corresponding one of the number of gas channels to the corresponding one of the number of gas vents.

Abstract: A hydraulic lash adjuster (17;61;81) in which the body (19) defines a body bore (39) extending over substantially the entire axial length of the body, thus making it possible to finish the bore (39) by a more accurate process, such as honing. In the FIG. 2 embodiment, there is a cylindrical member (71) disposed in the lower portion of the body bore (39) cooperating to define a leakdown clearance (39,71 S), to isolate side load on the plunger (25) the leakdown. In the FIG. 3 embodiment, there is both the leakdown clearance (23S,39) between the body bore and the plunger (23) and the leakdown clearance (39,71 S) between the body bore and the cylindrical member (71), the leakdown flow rate of FIG. 3 being variable if the body and the cylindrical member (71) comprise dissimilar metals, having different coefficients of thermal expansion.

Abstract: A method, that arbitrates when each of a plurality of sensors can perform an object detection procedure, assigns a different binary address to each sensor. Each bit in the binary address is sequentially selected. While a bit is selected, every sensor applies a signal to a communication link, which signal has a first or a second logic level as denoted by the value of the selected bit of that sensor's address. Those sensors applying the first logic level to the communication link determine if another sensor is applying the second logic level, in which case those proximity sensors suspend participation in the arbitration method. After all the bits have been selected, only one sensor remains active and that sensor is allowed to perform the object detection procedure. Thereafter, each proximity sensor resumes participation in the arbitration method with a different address and the process is repeated.

Abstract: The control apparatus includes a plurality of control units. Each control unit includes a cable containing electrical conductors. Male and female connectors may be disposed at opposite end portions of the cable. An inline connector may be disposed between the male and female connectors and is connected with the electrical conductors. A sensor has terminals which are engagable with terminals in the inline conductor to connect the sensor with the electrical conductors in the cable. Upon disconnection of one sensor from the control apparatus, an electrical connection is maintained with the remaining sensors.

Abstract: An ion source (50) for an ion implanter is provided, comprising a remotely located vaporizer (51) and an ionizer (53) connected to the vaporizer by a feed tube (62). The vaporizer comprises a sublimator (52) for receiving a solid source material such as decaborane and sublimating (vaporizing) the decaborane. A heating mechanism is provided for heating the sublimator, and the feed tube connecting the sublimator to the ionizer, to maintain a suitable temperature for the vaporized decaborane. The ionizer (53) comprises a body (96) having an inlet (119) for receiving the vaporized decaborane; an ionization chamber (108) in which the vaporized decaborane may be ionized by an energy-emitting element (110) to create a plasma; and an exit aperture (126) for extracting an ion beam comprised of the plasma. A cooling mechanism (100, 104) is provided for lowering the temperature of walls (128) of the ionization chamber (108) (e.g., to below 350° C.

Abstract: A method for dynamically controlling regenerating energy flow and direct current bus voltage for an adjustable frequency drive system includes sensing a direct current voltage of a direct current bus; and sensing a plurality of alternating currents at outputs of an inverter. The sensed alternating currents are transformed to a stationary current vector. Voltage and frequency values are converted to a stationary voltage vector and an angle. The angle and the stationary current vector are transformed to a rotating current vector including torque and flux producing current components. An induction machine generating mode is determined when the torque producing current component reverses polarity. The voltage and frequency values limit the direct current voltage of the direct current bus at a predetermined threshold responsive to the generating mode. The stationary voltage vector and the angle are converted to pulse width modulated control inputs of the inverter.

Abstract: The invention provides a wafer pad assembly for use in an ion implanter for mounting and cooling a wafer. The wafer pad assembly comprises a wafer support pad having an upper surface for mounting the wafer and a lower surface. The lower surface of the wafer support pad is connected to a coolant passage having an inlet section and an outlet section arranged in an opposed configuration, wherein said inlet section is counterbalanced by said outlet section. The lower surface is connected to a frame having an outer curved surface in mating engagement with a complementary shaped bearing surface of a housing wherein said wafer can be tilted or rotated about an axis.

Abstract: The invention provides a wafer pad assembly and actuation system for use in an ion implanter, preferably a batch-type ion implanter. The wafer pad assembly includes a rotatable wafer support pad having an upper surface for mounting the wafer, and a lower surface rotationally mounted to a housing of the wafer pad assembly. The lower surface of the wafer support pad further comprises a flange connected to a rotatable shaft. The shaft is connected to an actuator for selectively indexing the shaft so that the wafer support pad is rotationally indexed about its geometric center. The lower surface of the wafer support pad is also connected to a frame having an outer curved surface rotatably mounted within a mating bearing surface of a housing. The curved frame is connected to a plurality of linkages for moving the wafer support pad within the curved frame so that the wafer is pivotable or tiltable about its geometric center.

Abstract: A reversible DC motor drive includes a DC/DC converter having a DC input, a first output having a first pulsed DC voltage and first DC voltage value, a second output having a second pulsed DC voltage and second DC voltage value, and a third output having a third pulsed DC voltage and third DC voltage value. The first and second outputs are adapted for electrical interconnection with armature terminals of a DC motor, and the third output is adapted for electrical interconnection with a field terminal of the motor. A microprocessor routine calculates motor speed from the motor armature voltage, field current and armature current. An outer control loop for motor speed and two separately controllable inner control loops for armature and field current control the DC/DC converter responsive to the calculated motor speed and a speed reference in order to independently control the three DC voltage values.

Abstract: An adjustable magnetic trip unit for a circuit breaker includes a torsion spring which applies a bias force to the plunger of a trip solenoid. The torsion spring is mounted on a driven bevel gear and wound by an adjustment knob coupled to a driving bevel gear to adjust the current at which the solenoid is activated. An indexer having peripheral flats which engage a seat in the circuit breaker housing provides a plurality of discrete positions of the adjustment knob. Depressing the adjustment knob against a second spring unseats the indexer for rotation of the adjustment knob between settings. In addition, a slide with an inclined surface bearing against the plunger and coupled to the driven bevel gear, provides simultaneous adjustment of plunger gap with adjustment of the torsion spring force to increase the range of adjustment.

Abstract: Disclosed herein is a sensor assembly (10) for attachment to an electrical conductor (5), which includes a base (20) having a cavity (22) and a pair of detector housings (30) extending from the base (20). The detector housings (30) are laterally spaced and substantially parallel and are provided to receive a magnetic field detector. An electronic circuit card (70) is disposed within the base cavity (22) and is operatively coupled to the magnetic field detectors. Additionally, an auxiliary circuit card (90)) that contains logic for detecting an arc fault may be provided for communicating with the electronic circuit card (70).

Abstract: A mass analysis magnet assembly (16) is provided for use in an ion implanter (10), comprising: (i) a magnet (44) for mass analyzing an ion beam (15) output by an ion source (14), the magnet providing an interior region (49) through which the ion beam passes; and (ii) at least one strike plate (48) in part forming an outer boundary of the interior region (49). The at least one strike plate is comprised of an isotopically pure carbon-based material. The isotopically pure carbon-based material, preferably by mass greater than 99% carbon C-12, prevents neutron radiation when impacted by deuterons extracted from the ion source (14). The strike plate (48) may comprise an upper layer (56) of isotopically pure carbon C-12 isotope positioned atop a lower substrate (54).

Abstract: An in-process charge monitor and control system (32) for an ion implanter is provided, comprising: (i) wafer support (22) upon which a plurality of wafers (W) may be positioned for implantation by an ion beam (18), the support having portions thereof disposed intermediate adjacent wafers that are more or less electrically conductive than surfaces of the wafers, the wafer support (22) further having a center (31) from which each of the plurality of wafers is substantially equidistant, the wafer support further provided with first and second apertures (64, 66) disposed substantially equidistant from the center (31); (ii) first and second electrical charge monitors (40, 38) for receiving first and second portions of the ion beam (18a, 18b) through the first and second apertures (64, 66), respectively, and for outputting first and second output signals (44, 42), respectively, indicative of an amount of ion beam current received; and (iii) a comparator (46) for comparing the first and second output signals (44, 42

Abstract: Electrical equipment (14) is safeguarded from damage due to parallel arc faults by a circuit that provides several levels of protection. A semiconductor switch (18) and a current sensor (24) are placed in series with the electrical equipment (14). When the current to the equipment exceeds a first threshold for a predefined period of time, the semiconductor switch (18) is rendered non-conductive until the circuit is specifically reset. When the current to the equipment exceeds a greater second threshold, a pulsed signal alternately places the semiconductor switch (18) in conductive and non-conductive states so that the average current applied to the equipment (14) is within an acceptable level. The pulses are measured to determine whether a parallel arc fault has occurred. When the measured pulses (74) are within a predetermined range, a parallel arc fault is declared and the semiconductor switch (18) is rendered non-conductive.

Abstract: A method of implanting ionized icosaborane (B20HX), triantaborane (B30HX), and sarantaborane (B40HX) into a workpiece is provided, comprising the steps of (i) vaporizing and ionizing decaborane in an ion source (50) to create a plasma; (ii) extracting ionized icosaborane, triantaborane, and sarantaborane (collectively “higher order boranes”) within the plasma through a source aperture (126) to form an ion beam; (iii) mass analyzing the ion beam with a mass analysis magnet (127) to permit ionized icosaborane (B20HX+) or one of the other higher order boranes to pass therethrough; and (iv) implanting the ionized icosaborane (B20HX+) or one of the other higher order boranes into a workpiece. The step of vaporizing and ionizing the decaborane comprises the substeps of (i) vaporizing decaborane in a vaporizer (51) and (ii) ionizing the vaporized decaborane in an ionizer (53).