Abstract: An amorphous multi-layered structure (100, 200) is formed by a method including the steps of: i) positioning a deposition substrate (101) in a physical vapor deposition apparatus, (300, 400, 500) ii) ionizing a precursor of a multi-phase material within the physical vapor deposition apparatus (300, 400, 500) iv) modulating the total ion impinging energy of the ions to deposit layers having predetermined properties corresponding to the total ion impinging energy values.
Type:
Grant
Filed:
February 25, 1998
Date of Patent:
June 20, 2000
Assignee:
Motorola, Inc.
Inventors:
Eric P. Menu, John Song, Bernard F. Coll