Abstract: Presented is a system and method for dynamically adjusting X-ray power levels to achieve consistent image quality. The method comprises estimating power and photon density based on current process parameters, comparing those estimates with reference values associated with desirable image quality, adjusting the X-ray power level in response to the operation of comparing, and then performing the operations of estimating, comparing, and adjusting so that the estimates approach the reference values. In embodiments, the estimating, comparing, and adjusting operations are performed dynamically as process parameters, such as X-ray spot size and distance to the target, dynamically change. The system comprises a database for storing the reference values and a processor for estimating the photon and power density based on current process parameters, comparing the reference values with the estimates, and outputting a signal to adjust one of the current process parameters such as X-ray power level.

Abstract: A method for applying an abrasion-resistant coating to a substrate including the steps of generating an atmospheric plasma, introducing a precursor to the atmospheric plasma, the precursor being selected to form the abrasion-resistant coating, and positioning the substrate relative to the atmospheric plasma such that the atmospheric plasma deposits the abrasion-resistant coating onto the substrate.

Abstract: A first method locates a component positioned underneath a surface of a target object using a pointing instrument, wherein a position of the component in the target object coordinate system is known. The first method includes calculating an orientation of the aim point axis of the instrument in the instrument coordinate system for the aim point axis of the instrument to be aligned with the component using at least an inverse calibration matrix, the position of the component in the target object coordinate system, and inverse kinematics of the instrument. The first method also includes rotating the aim point axis of the instrument to the calculated orientation. Second and third methods also are described for locating an access panel for accessing the component and/or maintenance zones in which the component resides.

Abstract: A system for selectively removing at least one undesirable ion from an acidic solution including a tank receiving the acidic solution, a chiller in fluid communication with the tank, the chiller being configured to reduce a temperature of the acidic solution, and an ion exchanger in fluid communication with the chiller, the ion exchanger including an ion exchange resin that is selective for the undesirable ion.