Abstract: A plasma processing apparatus for generating plasma in a chamber maintained in a vacuum state and processing a substrate using the plasma. The plasma processing apparatus includes a refrigerant channel for circulating a refrigerant formed in a shower head, thereby easily controlling the temperature of the shower head and improving the reproducibility of plasma treatment.
Type:
Grant
Filed:
December 20, 2005
Date of Patent:
February 15, 2011
Assignee:
Advanced Display Process Engineering Co. Ltd.
Inventors:
Young Jong Lee, Jun Young Choi, Saeng Hyun Jo, Young-Joo Hwang, Jong-Cheon Kim