Patents Represented by Attorney, Agent or Law Firm Kenneth Benson
  • Patent number: 6500053
    Abstract: This invention describes improved polishing pads useful in the manufacture ofsemiconductor devices or the like. The pads of the present invention may have an advantageous hydrophilic polishing material and are sufficiently thin to generally improve predictability and polishing performance.
    Type: Grant
    Filed: February 8, 2002
    Date of Patent: December 31, 2002
    Assignee: Rodel Holdings, Inc.
    Inventors: David B. James, Lee Melbourne Cook, Arthur Richard Baker
  • Patent number: 6354915
    Abstract: This invention describes improved polishing pads useful in the manufacture of semiconductor devices or the like. The pads of the present invention have an advantageous hydrophilic polishing material and are sufficiently thin to generally improve predictability and polishing performance.
    Type: Grant
    Filed: January 21, 2000
    Date of Patent: March 12, 2002
    Assignee: Rodel Holdings Inc.
    Inventors: David B. James, Lee Melbourne Cook, Arthur Richard Baker
  • Patent number: 6241586
    Abstract: A dry particulate solids composition is provided which may be reconstituted into a chemical-mechanical polishing slurry.
    Type: Grant
    Filed: October 6, 1999
    Date of Patent: June 5, 2001
    Assignee: Rodel Holdings Inc.
    Inventor: Paul J. Yancey
  • Patent number: 6071178
    Abstract: A polishing pad is provided comprising an upper surface and a lower surface, substantially parallel to one another, wherein the pad has enhanced flexibility produced by scoring of either or both surfaces. The pad thickness is generally greater than 500.mu.. The scoring creates slits having a depth of less than 90% of the thickness.
    Type: Grant
    Filed: July 2, 1998
    Date of Patent: June 6, 2000
    Assignee: Rodel Holdings Inc.
    Inventor: Arthur Richard Baker, III