Abstract: A DC magnetron sputter reactor for sputtering deposition materials such as tantalum and tantalum nitride, for example, and its method of use, in which self-ionized plasma (SIP) sputtering and capacitively coupled plasma (CCP) sputtering are promoted, either together or alternately, in the same chamber. Also, bottom coverage may be thinned or eliminated by inductively-coupled plasma (ICP) resputtering. SIP is promoted by a small magnetron having poles of unequal magnetic strength and a high power applied to the target during sputtering. CCP is provided by a pedestal electrode which capacitively couples RF energy into a plasma. The CCP plasma is preferably enhanced by a magnetic field generated by electromagnetic coils surrounding the pedestal which act to confine the CCP plasma and increase its density.

Abstract: An alignment tool, method and system are provided for aligning a cassette handler to a robot blade in a workpiece handling system, in which the tool comprises a frame or fixture adapted to be supported by the cassette handler support surface, in which the frame has one or more distance sensors positioned to measure the distance of a workpiece or robot blade from the sensor or a predetermined reference point or surface. In a preferred embodiment, the frame emulates a workpiece cassette and the distance sensors provide a numerical output of the distance to the workpiece. As explained in greater detail below, these distance measurements facilitate accurately leveling and aligning the cassette handler support surface relative to a workpiece supported by the robot blade such that when the frame is replaced by an actual workpiece cassette, the workpiece cassette will also be level and aligned with respect to the robot blade and the workpiece held by the blade.

Abstract: An apparatus, system and method for measuring a feature of a three-dimensional object, such as a wafer carrier, are provided. The apparatus is for use with an optical scanner and comprises a mounting structure adapted to be disposed on the scanner. The mounting structure has a calibration mark adapted to be read by the scanner and is adapted to position the object so that it is at a first pre-determined distance from the calibration mark. In one aspect of the present invention, the mounting structure further comprises an alignment surface adapted to abut the object. The alignment surface is disposed at a second pre-determined distance from the calibration mark. In another aspect of the present invention, the alignment surface is adapted to abut the object at a point spaced apart from the scanning surface.

Abstract: In one embodiment, a target alignment surface disposed on a target support mechanically engages a darkspace shield alignment surface disposed on a darkspace shield as the target is lodged into a chamber body. The respective alignment surfaces are shaped and positioned so that the darkspace shield is physically moved to a desired aligned position as the alignment surfaces engage each other. In this manner a darkspace shield may be directly aligned to a target within a semiconductor fabrication chamber to provide a suitable darkspace gap between the target and the darkspace shield.

Abstract: A test station for testing polishing heads for planarizing semiconductor wafers and other substrates has a head positioning control system which can precisely position the polishing head at one of many electronically controlled positions above the test station platform. The test station may also include a lateral carriage assembly which supports the polishing head above a base plate of the station and permits the polishing head to be moved in a gliding motion above the surface of the test station test wafer. A sensor senses when the carriage of the assembly is moved from a load position. In response, the test station controller causes a vertical actuator to lift the head mount in the vertical or Z direction. In this position, there is sufficient clearance for the polishing head being carried by the carriage to slide under the head mount and into position for mounting to the head adapter.

Abstract: Provided is an ion implanter having a deceleration lens assembly comprising a plurality of electrodes in which one or more of the apertures of the deceleration electrodes are shaped in a manner which can improve performance of the ion implanter. In one embodiment, an electrode aperture is generally elliptical in shape and conforms generally to the shape of the beam passing through the aperture. In another aspect, an axis segment extends 40% of the length of the aperture from the aperture center to an intermediate point at the end of the segment. The average width of the aperture measured at each point from the center to the intermediate point is substantially less than the maximum width of the aperture.

Abstract: A system is provided in which a smaller flow of deposition solution is diverted from a larger flow of deposition solution flowing on an electrochemical deposition tool platform. The smaller flow is diverted to a dosing unit which may be on a separate platform. The dosing unit in one embodiment comprises a pressurized flow line.

Abstract: Test substrates used to test semiconductor fabrication tools are reclaimed by reading from a database the process steps performed on each test substrate and selecting a reclamation process from a plurality of reclamation processes, for reclaiming each test substrate. Information identifying the processes performed on each test substrate and the reclamation process selected for each test substrate, may be stored in a test substrate history database. Each test substrate is sorted and placed into a group of test substrates having a common reclamation process assigned to the test substrates of the group. The bins in which the sorted test substrates are stored are each labeled with identifying information including basic or detailed information on the reclamation process selected for the test substrates stored in the bin. The information may also include a list of the test substrates stored in each bin.

Abstract: Provided is a medium feeding aparatus having at least one align roller to align medium in a path, wherein the align roller is positioned below the medium and is driven to transport the medium in the path. A feed assistance member includes a shaft and a feed assistance roller rotably mounted to the shaft and positioned to apply pressure on the medium in the path to stabilize the medium while the medium is being aligned in the path by the at least one align wherein the feed assistance roller is not vertically aligned with any roller.

Abstract: An alignment tool, method and system are provided for aligning a cassette handler to a robot blade in a workpiece handling system, in which the tool comprises a frame or fixture adapted to be supported by the cassette handler support surface, in which the frame has one or more distance sensors positioned to measure the distance of a workpiece or robot blade from the sensor or a predetermined reference point or surface. In a preferred embodiment, the frame emulates a workpiece cassette and the distance sensors provide a numerical output of the distance to the workpiece. As explained in greater detail below, these distance measurements facilitate accurately leveling and aligning the cassette handler support surface relative to a workpiece supported by the robot blade such that when the frame is replaced by an actual workpiece cassette, the workpiece cassette will also be level and aligned with respect to the robot blade and the workpiece held by the blade.

Abstract: A carrier alignment tool system in accordance with a preferred embodiment of the present invention provides a tool and method of using the tool, which emulates the door of a substrate carrier having a removable door. The tool permits the alignment between a door opener mechanism and the load-port or other handler, on which a carrier is to be supported to be tested and corrected, until proper alignment is achieved prior to beginning substrate processing.

Abstract: An alignment tool, method and system for aligning a cassette handler to a robot blade in a workpiece handling system so as to compensate for tilt exhibited by an elevator shaft as the cassette is elevated between various slot positions. In one embodiment, the cassette tilt angle may be measured at a first height of the cassette. After activating the elevator to raise the cassette to a second slot position, preferably near the other end of the cassette, the tilt angle of the cassette may be measured again. If the tilt angle has changed, such change has likely been induced by the elevator. The cassette tilt angle may be adjusted in accordance with the measured angle at which the elevator shaft tilts the cassette as the cassette is raised or lowered to reduce accidental breakage or damaging of wafers or other workpieces.

Abstract: An alignment tool, method and system are provided for aligning a robot blade in a workpiece handling system, in which the tool comprises a frame or fixture adapted to be supported by a transfer chamber support surface or other support surface in the system, in which the frame has one or more non-contact distance sensors positioned to measure the distance of a workpiece or robot blade from the sensor or a predetermined reference point or surface. In one embodiment, the frame is used to align a robot blade relative to a robot support alignment surface in a robot chamber. In another embodiment, the frame emulates a workpiece cassette and the distance sensors provide an output to align the robot blade to a cassette support alignment surface. As a consequence, accidental scratching and breakage of workpieces such as semiconductor wafers and display substrates may be reduced or eliminated.

Abstract: Provided is a method, system, program, and data structures for making data available to an application program. A result table is generated including rows corresponding to a subset of rows in a base table having data in one or more columns that satisfy a query predicate clause. The result table includes, for each row, a location identifier of the corresponding row in the base table and a column for each column in a query select list. The result table is accessed to return requested data from the base table to the application program.

Abstract: In a plasma deposition system for depositing a film of sputtered target material on a substrate, the output of an RF generator coupled to a coil for generating a plasma can be varied during the deposition process so that heating and sputtering of the RF coil can be more uniform by “time-averaging” RF voltage distributions along the RF coil.

Abstract: Certain embodiments relate to methods for making a semiconductor device that inhibit the formation of a parasitic device. A method for making a semiconductor device includes a delimiting step and a dopant implantation step. The delimiting step partially oxidizes a single-crystal silicon layer provided on a semiconductor substrate 11 with an insulating layer therebetween to form a plurality of isolated single-crystal-silicon-layer segments 13a delimited by the insulating layer 16. In the implantation step, dopant ions 18 are implanted into the single-crystal-silicon-layer segments 13a to activate the single-crystal-silicon-layer segments 13a. In this implantation step, the dopant is implanted into the single-crystal-silicon-layer segments 13a by an implantation energy which is set so that the position of the maximum of the dopant concentration lies at bottom edges Ea and Eb of each single-crystal-silicon-layer segment 13a.

Abstract: A lubricating perfluoropolyether (PFPE) composition for lubricating one or more disks in a disk drive system may be formed by providing a first component of PFPE molecules having an aggregate vapor pressure in the range of 1×10−6 to 1×10−11 atm and a second component of PFPE molecules comprising at least 5% of the total number of molecules of the first component, wherein the second component includes an aggregate vapor pressure lower than that of the first component. The first and second components are mixed together to form a homogeneous composition, which may be in the liquid form. The composition may be introduced into a reservoir in a vapor phase lubricant reservoir system in a disk drive enclosure.

Abstract: One embodiment relates to an apparatus for sputtering material onto a workpiece, the apparatus including a vacuum chamber and a target disposed in the vacuum chamber, the target comprising a material to be deposited onto said workpiece. The apparatus also includes a holder for the workpiece and at least one recyclable process kit component positioned to accumulate material sputtered from the target. The process kit component includes a base metal layer including titanium and an outer layer of titanium nitride. The titanium nitride layer acts as an etch stop during recycling of the process kit component. The process kit component may include a part selected from the group of a shield, pedestal, shutter, coil, collimator, deposition ring, cover ring, and clamp ring.

Abstract: Disclosed is a system, method, and program for magnifying displayed content downloaded from a server over a network. Information is received indicating selection of a region of the displayed content to magnify. A determination is made of at least one region of the selected region including image content. The server maintains a high resolution file version and a low resolution file version of the image content. A determination is then made as to whether the selected image content from the displayed image file is the low resolution file version. If so, a command is generated to retrieve from the server specific byte locations from the high resolution file version including the image content in the selected region. The specified bytes are less than all the image data bytes in the high resolution version of the file if the image content in the selected region comprises less than all of the image content maintained in the high resolution version of the file.

Abstract: Disclosed is a method, system, and program for diagnosing a computer over a network, such as the Internet. A program, such as an applet, is provided that executes on the computer. The program causes the computer to download at least one object from a server over the network. Performance data is determined with respect to downloading the object from the server to the computer over the network in order to diagnose performance problems with the computer. The determined performance data is then transmitted to a diagnostic system over the network.