Patents Represented by Attorney, Agent or Law Firm Kristen Harrell
  • Polishing composition containing conducting polymer
    Patent number: 6811474
    Abstract: The invention provides a polishing system comprising (a) an abrasive, a polishing pad, a means for oxidizing a substrate, or any combination thereof, (b) a conducting polymer having an electrical conductivity of about 10−10 S/cm to about 106 S/cm, and (c) a liquid carrier.
    Type: Grant
    Filed: July 19, 2002
    Date of Patent: November 2, 2004
    Assignee: Cabot Microelectronics Corporation
    Inventors: Isaac K. Cherian, Jian Zhang, Fred Sun, Shumin Wang, Eric H. Klingenberg